Inventor · disambiguated record
Ian P. Stobert
Also filed as: STOBERT IAN · STOBERT IAN P
9 granted patents·3 pending applications·70 citations·filing 2005–2024
87Inventor score
Top patents by PatentIndex Score
12 records- 0195US8627245B1Density balancing in multiple patterning lithography using integrated circuit layout fillBANERJEE SHAYAK·Filed 2012·Granted Jan 7, 2014·19 cites·17 claims
- 0292US9690898B2Generative learning for realistic and ground rule clean hot spot synthesisGLOBALFOUNDRIES INC·Filed 2015·Granted Jun 27, 2017·13 cites·19 claims
- 0390US10831977B1Curvilinear mask modelsGLOBALFOUNDRIES INC·Filed 2019·Granted Nov 10, 2020·8 cites·20 claims
- 0486US9311443B2Correcting for stress induced pattern shifts in semiconductor manufacturingGLOBALFOUNDRIES INC·Filed 2014·Granted Apr 12, 2016·8 cites·21 claims
- 0584US8015511B2Adjustment of mask shapes for improving printability of dense integrated circuit layoutIBM·Filed 2009·Granted Sep 6, 2011·8 cites·24 claims
- 0677US9311442B2Net-voltage-aware optical proximity correction (OPC)GLOBALFOUNDRIES INC·Filed 2014·Granted Apr 12, 2016·4 cites·19 claims
- 0772US7380233B2Method of facilitating integrated circuit design using manufactured property valuesIBM·Filed 2005·Granted May 27, 2008·9 cites·20 claims
- 0858US7844938B2Data correcting hierarchical integrated circuit layout accommodating compensate for long range critical dimension variationIBM·Filed 2008·Granted Nov 30, 2010·1 cites·21 claims
- 0957US2025348054A1Analysis and manufacture of curved features for integrated circuitsGLOBALFOUNDRIES US INC·Filed 2024·Application pending·0 cites
- 1045US9058457B2Reticle data decomposition for focal plane determination in lithographic processesIBM·Filed 2013·Granted Jun 16, 2015·0 cites·17 claims
- 1142US2014297223A1Method for using optical metrology to monitor critical dimension uniformityIBM·Filed 2013·Application pending·0 cites
- 1234US2007174012A1Method Of Determining Photomask Inspection CapabilitiesBADGER KAREN D·Filed 2006·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →