Inventor · disambiguated record
John M. De Larios
Also filed as: DE LARIOS JOHN · DE LARIOS JOHN M · DE LARIOS JOHN MARTIN
83 granted patents·14 pending applications·1,619 citations·filing 1992–2014
99Inventor score
Top patents by PatentIndex Score
97 records- 0198US6988327B2Methods and systems for processing a substrate using a dynamic liquid meniscusLAM RES CORP·Filed 2003·Granted Jan 24, 2006·164 cites·42 claims
- 0296US6488040B1Capillary proximity heads for single wafer cleaning and dryingLAM RES CORP·Filed 2000·Granted Dec 3, 2002·178 cites·29 claims
- 0395US7367345B1Apparatus and method for providing a confined liquid for immersion lithographyLAM RES CORP·Filed 2004·Granted May 6, 2008·62 cites·22 claims
- 0495US6616772B2Methods for wafer proximity cleaning and dryingLAM RES CORP·Filed 2002·Granted Sep 9, 2003·110 cites·16 claims
- 0595US6594847B1Single wafer residue, thin film removal and cleanLAM RES CORP·Filed 2000·Granted Jul 22, 2003·112 cites·18 claims
- 0693US7198055B2Meniscus, vacuum, IPA vapor, drying manifoldLAM RES CORP·Filed 2002·Granted Apr 3, 2007·41 cites·20 claims
- 0793US7143527B2System and method for modulating flow through multiple ports in a proximity headLAM RES CORP·Filed 2005·Granted Dec 5, 2006·19 cites·20 claims
- 0892US7749689B2Methods for providing a confined liquid for immersion lithographyLAM RES CORP·Filed 2008·Granted Jul 6, 2010·13 cites·14 claims
- 0992US7350316B2Meniscus proximity system for cleaning semiconductor substrate surfacesLAM RES CORP·Filed 2007·Granted Apr 1, 2008·11 cites·14 claims
- 1092US7234477B2Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfacesLAM RES CORP·Filed 2002·Granted Jun 26, 2007·55 cites·30 claims
- 1192US7000622B2Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscusLAM RES CORP·Filed 2003·Granted Feb 21, 2006·50 cites·11 claims
- 1292US6303551B1Cleaning solution and method for cleaning semiconductor substrates after polishing of cooper filmLAM RES CORP·Filed 2000·Granted Oct 16, 2001·55 cites·7 claims
- 1391US7069937B2Vertical proximity processorLAM RES CORP·Filed 2003·Granted Jul 4, 2006·49 cites·8 claims
- 1490US5806126AApparatus for a brush assemblyONTRAK SYSTEMS INC·Filed 1997·Granted Sep 15, 1998·97 cites·7 claims
- 1589US7696141B2Cleaning compound and method and system for using the cleaning compoundLAM RES CORP·Filed 2006·Granted Apr 13, 2010·10 cites·28 claims
- 1689US7153400B2Apparatus and method for depositing and planarizing thin films of semiconductor wafersLAM RES CORP·Filed 2003·Granted Dec 26, 2006·33 cites·12 claims
- 1788US7737097B2Method for removing contamination from a substrate and for making a cleaning solutionLAM RES CORP·Filed 2006·Granted Jun 15, 2010·11 cites·22 claims
- 1888US7127831B2Methods and systems for processing a substrate using a dynamic liquid meniscusLAM RES CORP·Filed 2005·Granted Oct 31, 2006·9 cites·27 claims
- 1988US6616516B1Method and apparatus for asymmetric processing of front side and back side of semiconductor substratesLAM RES CORP·Filed 2001·Granted Sep 9, 2003·42 cites·22 claims
- 2087US7862662B2Method and material for cleaning a substrateLAM RES CORP·Filed 2006·Granted Jan 4, 2011·10 cites·13 claims
- 2187US5294568AMethod of selective etching native oxideGENUS INC·Filed 1992·Granted Mar 15, 1994·111 cites·17 claims
- 2286US6622335B1Drip manifold for uniform chemical deliveryLAM RES CORP·Filed 2000·Granted Sep 23, 2003·32 cites·22 claims
- 2385US7799141B2Method and system for using a two-phases substrate cleaning compoundLAM RES CORP·Filed 2006·Granted Sep 21, 2010·8 cites·24 claims
- 2485US7648584B2Method and apparatus for removing contamination from substrateLAM RES CORP·Filed 2006·Granted Jan 19, 2010·9 cites·27 claims
- 2585US7584761B1Wafer edge surface treatment with liquid meniscusLAM RES CORP·Filed 2005·Granted Sep 8, 2009·10 cites·8 claims
- 2685US7395611B2System processing a substrate using dynamic liquid meniscusLAM RES CORP·Filed 2006·Granted Jul 8, 2008·7 cites·20 claims
- 2785US7383843B2Method and apparatus for processing wafer surfaces using thin, high velocity fluid layerLAM RES CORP·Filed 2004·Granted Jun 10, 2008·28 cites·17 claims
- 2883US7997288B2Single phase proximity head having a controlled meniscus for treating a substrateLAM RES CORP·Filed 2007·Granted Aug 16, 2011·8 cites·16 claims
- 2982US8137474B2Cleaning compound and method and system for using the cleaning compoundFREER ERIK M·Filed 2010·Granted Mar 20, 2012·4 cites·15 claims
- 3082US7913703B1Method and apparatus for uniformly applying a multi-phase cleaning solution to a substrateLAM RES CORP·Filed 2006·Granted Mar 29, 2011·6 cites·14 claims
- 3181US8716210B2Material for cleaning a substrateFREER ERIK M·Filed 2010·Granted May 6, 2014·4 cites·18 claims
- 3281US8475599B2Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutionsFREER ERIK M·Filed 2006·Granted Jul 2, 2013·6 cites·12 claims
- 3381US7387689B2Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfacesLAM RES CORP·Filed 2007·Granted Jun 17, 2008·6 cites·20 claims
- 3481US7383601B2Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the sameLAM RES CORP·Filed 2006·Granted Jun 10, 2008·7 cites·16 claims
- 3580US7947157B2Apparatus and method for depositing and planarizing thin films of semiconductor wafersLAM RES CORP·Filed 2006·Granted May 24, 2011·5 cites·15 claims
- 3680US7703462B2Reduction of entrance and exit marks left by a substrate-processing meniscusLAM RES CORP·Filed 2006·Granted Apr 27, 2010·4 cites·13 claims
- 3780US7389783B2Proximity meniscus manifoldLAM RES CORP·Filed 2004·Granted Jun 24, 2008·24 cites·10 claims
- 3879US8671959B2Method and apparatus for cleaning a substrate using non-newtonian fluidsDE LARIOS JOHN M·Filed 2011·Granted Mar 18, 2014·4 cites·7 claims
- 3979US7597765B2Post etch wafer surface cleaning with liquid meniscusLAM RES CORP·Filed 2006·Granted Oct 6, 2009·7 cites·15 claims
- 4079US7240679B2System for substrate processing with meniscus, vacuum, IPA vapor, drying manifoldLAM RES CORP·Filed 2002·Granted Jul 10, 2007·12 cites·7 claims
- 4179US7170190B1Apparatus for oscillating a head and methods for implementing the sameLAM RES CORP·Filed 2003·Granted Jan 30, 2007·21 cites·17 claims
- 4278US8522799B2Apparatus and system for cleaning a substrateFREER ERIK M·Filed 2006·Granted Sep 3, 2013·6 cites·8 claims
- 4378US8043441B2Method and apparatus for cleaning a substrate using non-Newtonian fluidsLAM RES CORP·Filed 2005·Granted Oct 25, 2011·4 cites·7 claims
- 4477US7806126B1Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the sameLAM RES CORP·Filed 2005·Granted Oct 5, 2010·5 cites·19 claims
- 4576US8480810B2Method and apparatus for particle removalFREER ERIK M·Filed 2006·Granted Jul 9, 2013·5 cites·19 claims
- 4676US7252097B2System and method for integrating in-situ metrology within a wafer processLAM RES CORP·Filed 2003·Granted Aug 7, 2007·18 cites·15 claims
- 4775US7722724B2Methods for substrate processing in cluster tool configurations having meniscus application systemsLAM RES CORP·Filed 2007·Granted May 25, 2010·2 cites·15 claims
- 4875US7383844B2Meniscus, vacuum, IPA vapor, drying manifoldLAM RES CORP·Filed 2006·Granted Jun 10, 2008·2 cites·14 claims
- 4973US7591613B2Method and apparatus for transporting a substrate using non-newtonian fluidLAM RES CORP·Filed 2008·Granted Sep 22, 2009·3 cites·13 claims
- 5073US7192488B2Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscusLAM RES CORP·Filed 2005·Granted Mar 20, 2007·3 cites·18 claims
Showing the top 50 of 97 patent records by PatentIndex Score.
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