Inventor · disambiguated record
Marina Medvedeva
Also filed as: MEDVEDEVA MARINA · MEDVEDEVA MARINA M
11 granted patents·76 citations·filing 2001–2005
89Inventor score
Top patents by PatentIndex Score
11 records- 0180US7340706B2Method and system for analyzing the quality of an OPC maskLSI LOGIC CORP·Filed 2005·Granted Mar 4, 2008·7 cites·24 claims
- 0277US7039896B2Gradient method of mask edge correctionLSI LOGIC CORP·Filed 2003·Granted May 2, 2006·18 cites·24 claims
- 0373US7406675B2Method and system for improving aerial image simulation speedsLSI CORP·Filed 2005·Granted Jul 29, 2008·4 cites·27 claims
- 0470US6934410B1Mask correction for photolithographic processesLSI LOGIC CORP·Filed 2001·Granted Aug 23, 2005·13 cites·28 claims
- 0569US6854104B2First approximation for OPC significant speed-upLSI LOGIC CORP·Filed 2002·Granted Feb 8, 2005·13 cites·10 claims
- 0659US7035446B2Quality measurement of an aerial imageLSI LOGIC CORP·Filed 2002·Granted Apr 25, 2006·6 cites·23 claims
- 0759US6813758B2Optical proximity correction driven hierarchyLSI LOGIC CORP·Filed 2002·Granted Nov 2, 2004·7 cites·20 claims
- 0855US6911285B2Sidelobe correction for attenuated phase shift masksLSI LOGIC CORP·Filed 2002·Granted Jun 28, 2005·4 cites·15 claims
- 0954US7260814B2OPC edge correction based on a smoothed mask designLSI CORP·Filed 2004·Granted Aug 21, 2007·4 cites·21 claims
- 1047US7401318B2Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposesLSI CORP·Filed 2005·Granted Jul 15, 2008·0 cites·6 claims
- 1140US6988260B2Method and apparatus for optimizing fragmentation of boundaries for optical proximity correction (OPC) purposesLSI LOGIC CORP·Filed 2003·Granted Jan 17, 2006·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →