Inventor · disambiguated record
Chue-San Yoo
Also filed as: YOO CHUE S · YOO CHUE SAN
61 granted patents·6 pending applications·1,784 citations·filing 1990–2024
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG47TAIWAN SEMICONDUCTOR MFG CO LTD17LIN CHENG-MING1YOO CHUE S1YOO CHUE-SAN1
Top patents by PatentIndex Score
67 records- 0197US12013632B2Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0297US6071783APseudo silicon on insulator MOSFET deviceTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Jun 6, 2000·175 cites·27 claims
- 0396US6346729B1Pseudo silicon on insulator MOSFET deviceTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Feb 12, 2002·110 cites·4 claims
- 0495US11143952B2Pellicle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 12, 2021·5 cites·20 claims
- 0591US10126666B2Apparatus and a method of forming a particle shieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Nov 13, 2018·6 cites·20 claims
- 0689US10670959B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·2 cites·17 claims
- 0789US6271125B1Method to reduce contact hole aspect ratio for embedded DRAM arrays and logic devices, via the use of a tungsten bit line structureTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Aug 7, 2001·42 cites·11 claims
- 0887US10168626B2Apparatus and a method of forming a particle shieldTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 1, 2019·4 cites·20 claims
- 0986US6017791AMulti-layer silicon nitride deposition method for forming low oxidation temperature thermally oxidized silicon nitride/silicon oxide (no) layerTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Jan 25, 2000·84 cites·15 claims
- 1086US2024103358A1System and structure including a pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1185US11506971B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 22, 2022·1 cites·19 claims
- 1285US5393685APeeling free metal silicide films using rapid thermal annealTAIWAN SEMICONDUCTOR MFG·Filed 1992·Granted Feb 28, 1995·64 cites·19 claims
- 1385US5372957AMultiple tilted angle ion implantation MOSFET methodTAIWAN SEMICONDUCTOR MFG·Filed 1993·Granted Dec 13, 1994·92 cites·13 claims
- 1485US2024329517A1Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 1583US11868041B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 9, 2024·0 cites·20 claims
- 1683US6168984B1Reduction of the aspect ratio of deep contact holes for embedded DRAM devicesTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jan 2, 2001·61 cites·32 claims
- 1783US5729041AProtective film for fuse window passivation for semiconductor integrated circuit applicationsTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Mar 17, 1998·62 cites·18 claims
- 1883US5605853AMethod of making a semiconductor device having 4 transistor SRAM and floating gate memory cellsTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Feb 25, 1997·49 cites·15 claims
- 1981US5866451AMethod of making a semiconductor device having 4t sram and mixed-mode capacitor in logicTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Feb 2, 1999·45 cites·15 claims
- 2081US5545588AMethod of using disposable hard mask for gate critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 1995·Granted Aug 13, 1996·56 cites·45 claims
- 2180US8268541B2Mask and blank storage inner gasLIN CHENG-MING·Filed 2007·Granted Sep 18, 2012·6 cites·10 claims
- 2280US5858830AMethod of making dual isolation regions for logic and embedded memory devicesTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Jan 12, 1999·60 cites·8 claims
- 2379US5578517AMethod of forming a highly transparent silicon rich nitride protective layer for a fuse windowTAIWAN SEMICONDUCTOR MFG·Filed 1994·Granted Nov 26, 1996·50 cites·22 claims
- 2479US5541131APeeling free metal silicide films using ion implantationTAIWAN SEMICONDUCTOR MFG·Filed 1991·Granted Jul 30, 1996·48 cites·19 claims
- 2578US8986911B2Multiple-patterning photolithographic mask and methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Mar 24, 2015·2 cites·20 claims
- 2677US6015730AIntegration of SAC and salicide processes by combining hard mask and poly definitionTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Jan 18, 2000·54 cites·15 claims
- 2777US5605854AIntegrated Ti-W polycide for deep submicron processingTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Feb 25, 1997·42 cites·24 claims
- 2877US5180689ATapered opening sidewall with multi-step etching processTAIWAN SEMICONDUCTOR MFG·Filed 1991·Granted Jan 19, 1993·62 cites·20 claims
- 2975US6200836B1Using oxide junction to cut off sub-threshold leakage in CMOS devicesTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Mar 13, 2001·45 cites·24 claims
- 3074US7839480B2Photomask haze reduction via ventilationTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Nov 23, 2010·3 cites·16 claims
- 3174US6177340B1Method to reduce contact hole aspect ratio for embedded DRAM arrays and logic devices, via the use of a tungsten bit line structureTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jan 23, 2001·39 cites·10 claims
- 3273US5712201AFabrication method for integrating logic and single level polysilicon DRAM devices on the same semiconductor chipTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Jan 27, 1998·31 cites·24 claims
- 3372US5203957AContact sidewall tapering with argon sputteringTAIWAN SEMICONDUCTOR MFG·Filed 1991·Granted Apr 20, 1993·60 cites·20 claims
- 3471US5861673AMethod for forming vias in multi-level integrated circuits, for use with multi-level metallizationsTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Jan 19, 1999·44 cites·26 claims
- 3569US5573980AMethod of forming salicided self-aligned contact for SRAM cellsTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Nov 12, 1996·30 cites·19 claims
- 3667US6033969AMethod of forming a shallow trench isolation that has rounded and protected cornersTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Mar 7, 2000·43 cites·10 claims
- 3767US5879966AMethod of making an integrated circuit having an opening for a fuseTAIWAN SEMICONDUCTOR MFG·Filed 1994·Granted Mar 9, 1999·33 cites·7 claims
- 3867US5719079AMethod of making a semiconductor device having high density 4T SRAM in logic with salicide processTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Feb 17, 1998·35 cites·13 claims
- 3967US5089432APolycide gate MOSFET process for integrated circuitsTAIWAN SEMICONDUCTOR MFG·Filed 1990·Granted Feb 18, 1992·42 cites·13 claims
- 4063US5268244ASelf-aligned phase shifter formationTAIWAN SEMICONDUCTOR MFG·Filed 1992·Granted Dec 7, 1993·17 cites·15 claims
- 4163US2025374696A1Single photon avalanche diode for extreme ultraviolet photon detection and related methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4261US11289341B2Pattern transfer technique and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 29, 2022·0 cites·20 claims
- 4360US6025270APlanarization process using tailored etchback and CMPTAIWAN SEMICONDUCTOR MFG·Filed 1997·Granted Feb 15, 2000·24 cites·9 claims
- 4460US5965927AIntegrated circuit having an opening for a fuseTAIWAN SEMICONDUCTOR MFG·Filed 1998·Granted Oct 12, 1999·23 cites·17 claims
- 4560US5670423AMethod for using disposable hard mask for gate critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 1996·Granted Sep 23, 1997·22 cites·10 claims
- 4659US9513542B2Lithography mask and method of forming a lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Dec 6, 2016·0 cites·20 claims
- 4756US10012899B2Graphene pellicle for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 3, 2018·0 cites·20 claims
- 4854US9513552B2Multiple-patterning photolithographic mask and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Dec 6, 2016·0 cites·20 claims
- 4953US6670690B1Method of making an improved field oxide isolation structure for semiconductor integrated circuits having higher field oxide threshold voltagesTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Dec 30, 2003·3 cites·3 claims
- 5052US10490414B2Pattern transfer technique and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 26, 2019·0 cites·20 claims
Showing the top 50 of 67 patent records by PatentIndex Score.
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