Inventor · disambiguated record
Donald J. Samuels
Also filed as: SAMUELS DONALD · SAMUELS DONALD J · SAMUELS DONALD JAMES
19 granted patents·4 pending applications·948 citations·filing 1992–2015
96Inventor score
Top patents by PatentIndex Score
23 records- 0197US6777146B1Method of optical proximity correction with sub-resolution assistsIBM·Filed 2003·Granted Aug 17, 2004·219 cites·23 claims
- 0297US6426269B1Dummy feature reduction using optical proximity effect correctionIBM·Filed 1999·Granted Jul 30, 2002·210 cites·10 claims
- 0396US5523186ASplit and cover technique for phase shifting photolithographyIBM·Filed 1994·Granted Jun 4, 1996·119 cites·24 claims
- 0494US5937225APixel counting toner or ink use monitor and pixel counting method for monitoring the toner or ink useIBM·Filed 1997·Granted Aug 10, 1999·71 cites·13 claims
- 0593US5862058AOptical proximity correction method and systemIBM·Filed 1996·Granted Jan 19, 1999·105 cites·22 claims
- 0686US7043712B2Method for adaptive segment refinement in optical proximity correctionIBM·Filed 2003·Granted May 9, 2006·48 cites·20 claims
- 0786US6451490B1Method to overcome image shortening by use of sub-resolution reticle featuresIBM·Filed 2000·Granted Sep 17, 2002·35 cites·21 claims
- 0883US9910348B2Method of simultaneous lithography and etch correction flowGLOBALFOUNDRIES INC·Filed 2015·Granted Mar 6, 2018·4 cites·16 claims
- 0979US7465615B1Polyconductor line end formation and related maskIBM·Filed 2007·Granted Dec 16, 2008·5 cites·1 claims
- 1075US8423945B2Methods and systems to meet technology pattern density requirements of semiconductor fabrication processesBICKFORD JEANNE P·Filed 2010·Granted Apr 16, 2013·7 cites·9 claims
- 1170US6483937B1Process for inspecting an objectIBM·Filed 1999·Granted Nov 19, 2002·38 cites·20 claims
- 1268US7715059B2Facsimile system, method and program product with junk fax disposalIBM·Filed 2003·Granted May 11, 2010·11 cites·14 claims
- 1367US7993815B2Line ends formingIBM·Filed 2007·Granted Aug 9, 2011·3 cites·13 claims
- 1467US5304441AMethod of optimizing exposure of photoresist by patterning as a function of thermal modelingIBM·Filed 1992·Granted Apr 19, 1994·20 cites·5 claims
- 1564US7727825B2Polyconductor line end formation and related maskIBM·Filed 2008·Granted Jun 1, 2010·1 cites·15 claims
- 1662US6261724B1Method of modifying a microchip layout data set to generate a predicted mask printed data setIBM·Filed 1999·Granted Jul 17, 2001·20 cites·13 claims
- 1762US6034877ASemiconductor memory array having sublithographic spacing between adjacement trenches and method for making the sameIBM·Filed 1998·Granted Mar 7, 2000·15 cites·14 claims
- 1851US6268907B1Elimination of standing waves in photoresistIBM·Filed 1998·Granted Jul 31, 2001·12 cites·18 claims
- 1945US2009037866A1Alternating phase shift mask optimization for improved process windowIBM·Filed 2007·Application pending·0 cites
- 2042US6190959B1Semiconductor memory array having sublithographic spacing between adjacent trenches and method for making the sameIBM·Filed 1999·Granted Feb 20, 2001·5 cites·7 claims
- 2142US2009065956A1Memory cellIBM·Filed 2007·Application pending·0 cites
- 2242US2007226674A1System and method for semiconductor device fabrication using modelingHAFFNER HENNING·Filed 2006·Application pending·0 cites
- 2336US2002138810A1Optical proximity correction (OPC) using automated shape and edge pre-sortingFiled 2001·Application pending·0 cites
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