Inventor · disambiguated record
Donald Miles
Also filed as: MILES DONALD · MILES DONALD S
10 granted patents·3 pending applications·80 citations·filing 2002–2007
88Inventor score
Files withTEXAS INSTRUMENTS INC11
Top patents by PatentIndex Score
13 records- 0186US7422967B2Method for manufacturing a semiconductor device containing metal silicide regionsTEXAS INSTRUMENTS INC·Filed 2005·Granted Sep 9, 2008·15 cites·13 claims
- 0276US6830980B2Semiconductor device fabrication methods for inhibiting carbon out-diffusion in wafers having carbon-containing regionsTEXAS INSTRUMENTS INC·Filed 2003·Granted Dec 14, 2004·22 cites·38 claims
- 0375US7208409B2Integrated circuit metal silicide methodTEXAS INSTRUMENTS INC·Filed 2005·Granted Apr 24, 2007·6 cites·20 claims
- 0471US7422968B2Method for manufacturing a semiconductor device having silicided regionsTEXAS INSTRUMENTS INC·Filed 2004·Granted Sep 9, 2008·16 cites·20 claims
- 0566US7335595B2Silicide formation using a low temperature anneal processTEXAS INSTRUMENTS INC·Filed 2005·Granted Feb 26, 2008·3 cites·18 claims
- 0660US7029967B2Silicide method for CMOS integrated circuitsTEXAS INSTRUMENTS INC·Filed 2004·Granted Apr 18, 2006·7 cites·12 claims
- 0756US6831008B2Nickel silicide—silicon nitride adhesion through surface passivationTEXAS INSTRUMENTS INC·Filed 2002·Granted Dec 14, 2004·5 cites·15 claims
- 0853US6709938B2Source/drain extension fabrication process with direct implantationTEXAS INSTRUMENTS INC·Filed 2002·Granted Mar 23, 2004·4 cites·10 claims
- 0944US6737354B2Method of CMOS source/drain extension with the PMOS implant spaced by poly oxide and cap oxide from the gatesTEXAS INSTRUMENTS INC·Filed 2002·Granted May 18, 2004·2 cites·2 claims
- 1043US2008242072A1Plasma dry etch process for metal-containing gatesTEXAS INSTRUMENTS INC·Filed 2007·Application pending·0 cites
- 1140US2005090087A1Nickel silicide - silicon nitride adhesion through surface passivationFiled 2004·Application pending·0 cites
- 1236US6833292B2Reducing dopant losses during annealing processesTEXAS INSTRUMENTS INC·Filed 2003·Granted Dec 21, 2004·0 cites·6 claims
- 1333US2003235973A1Nickel SALICIDE process technology for CMOS devicesFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →