Inventor · disambiguated record
Moshe Sarfaty
Also filed as: SARFATY MOSHE
27 granted patents·5 pending applications·1,321 citations·filing 1998–2013
97Inventor score
Files withAPPLIED MATERIALS INC19SARFATY MOSHE4KLA TENCOR TECH CORP3WISCONSIN ALUMNI RES FOUND2LS BIOPATH INC1
Top patents by PatentIndex Score
32 records- 0197US6745095B1Detection of process endpoint through monitoring fluctuation of output dataAPPLIED MATERIALS INC·Filed 2000·Granted Jun 1, 2004·515 cites·35 claims
- 0294US7358494B1Material composition analysis system and methodKLA TENCOR TECH CORP·Filed 2005·Granted Apr 15, 2008·26 cites·15 claims
- 0394US6521080B2Method and apparatus for monitoring a process by employing principal component analysisAPPLIED MATERIALS INC·Filed 2001·Granted Feb 18, 2003·76 cites·16 claims
- 0491US6633391B1Monitoring of film characteristics during plasma-based semi-conductor processing using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2000·Granted Oct 14, 2003·57 cites·5 claims
- 0590US6455437B1Method and apparatus for monitoring the process state of a semiconductor device fabrication processAPPLIED MATERIALS INC·Filed 1999·Granted Sep 24, 2002·111 cites·37 claims
- 0690US6413867B1Film thickness control using spectral interferometryAPPLIED MATERIALS INC·Filed 1999·Granted Jul 2, 2002·101 cites·17 claims
- 0789US6627463B1Situ measurement of film nitridation using optical emission spectroscopyAPPLIED MATERIALS INC·Filed 2000·Granted Sep 30, 2003·46 cites·15 claims
- 0889US6368975B1Method and apparatus for monitoring a process by employing principal component analysisAPPLIED MATERIALS INC·Filed 1999·Granted Apr 9, 2002·90 cites·14 claims
- 0987US6603538B1Method and apparatus employing optical emission spectroscopy to detect a fault in process conditions of a semiconductor processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Aug 5, 2003·36 cites·21 claims
- 1082US6589869B2Film thickness control using spectral interferometryAPPLIED MATERIALS INC·Filed 2002·Granted Jul 8, 2003·26 cites·20 claims
- 1181US8417328B2Electrical systems for detection and characterization of abnormal tissue and cellsSARFATY MOSHE·Filed 2008·Granted Apr 9, 2013·22 cites·60 claims
- 1280US8437845B2Electrical methods for detection and characterization of abnormal tissue and cellsSARFATY MOSHE·Filed 2009·Granted May 7, 2013·19 cites·17 claims
- 1379US6888639B2In-situ film thickness measurement using spectral interference at grazing incidenceAPPLIED MATERIALS INC·Filed 2001·Granted May 3, 2005·21 cites·24 claims
- 1478US8865076B2Methods for detection and characterization of abnormal tissue and cells using an electrical systemLS BIOPATH INC·Filed 2013·Granted Oct 21, 2014·11 cites·15 claims
- 1578US6896763B2Method and apparatus for monitoring a process by employing principal component analysisFiled 2003·Granted May 24, 2005·18 cites·12 claims
- 1678US6843881B2Detecting chemiluminescent radiation in the cleaning of a substrate processing chamberAPPLIED MATERIALS INC·Filed 2002·Granted Jan 18, 2005·17 cites·15 claims
- 1775US6034781AElectro-optical plasma probeWISCONSIN ALUMNI RES FOUND·Filed 1998·Granted Mar 7, 2000·38 cites·18 claims
- 1873US6025916AWall deposition thickness sensor for plasma processing chamberWISCONSIN ALUMNI RES FOUND·Filed 1998·Granted Feb 15, 2000·41 cites·14 claims
- 1972US7046019B1Direct non contact measurementKLA TENCOR TECH CORP·Filed 2005·Granted May 16, 2006·5 cites·20 claims
- 2071US7042558B1Eddy-optic sensor for object inspectionAPPLIED MATERIALS INC·Filed 2003·Granted May 9, 2006·9 cites·24 claims
- 2171US6608495B2Eddy-optic sensor for object inspectionAPPLIED MATERIALS INC·Filed 2001·Granted Aug 19, 2003·15 cites·24 claims
- 2269US6855569B1Current leakage measurementKLA TENCOR TECH CORP·Filed 2003·Granted Feb 15, 2005·7 cites·20 claims
- 2361US7970588B2Method, system and medium for controlling manufacturing process using adaptive models based on empirical dataAPPLIED MATERIALS INC·Filed 2007·Granted Jun 28, 2011·2 cites·23 claims
- 2460US7668702B2Method, system and medium for controlling manufacturing process using adaptive models based on empirical dataAPPLIED MATERIALS INC·Filed 2003·Granted Feb 23, 2010·7 cites·31 claims
- 2559US6936842B2Method and apparatus for process monitoringAPPLIED MATERIALS INC·Filed 2002·Granted Aug 30, 2005·4 cites·11 claims
- 2655US9554743B2Methods for optical identification and characterization of abnormal tissue and cellsSARFATY MOSHE·Filed 2009·Granted Jan 31, 2017·1 cites·9 claims
- 2753US9566030B2Optical system for detection and characterization of abnormal tissue and cellsSARFATY MOSHE·Filed 2008·Granted Feb 14, 2017·0 cites·13 claims
- 2849US2006246683A1Integrated equipment set for forming a low K dielectric interconnect on a substrateAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 2941US2004007325A1Integrated equipment set for forming a low K dielectric interconnect on a substrateAPPLIED MATERIALS INC·Filed 2003·Application pending·0 cites
- 3036US2003133126A1Spectral reflectance for in-situ film characteristic measurementsAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 3134US2004070393A1Differential measurement method using eddy-current sensing to resolve a stack of conducting films on substratesFiled 2003·Application pending·0 cites
- 3233US2004207395A1Eddy current-capacitance sensor for conducting film characterizationFiled 2003·Application pending·0 cites
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