Inventor · disambiguated record
Jensheng Huang
Also filed as: HUANG JENSHENG
14 granted patents·63 citations·filing 2005–2018
91Inventor score
Top patents by PatentIndex Score
14 records- 0192US7853919B2Modeling mask corner rounding effects using multiple mask layersSYNOPSYS INC·Filed 2010·Granted Dec 14, 2010·8 cites·21 claims
- 0286US8250498B2Method and apparatus for calibrating a photolithography process model by using a process window parameterHUANG JENSHENG·Filed 2010·Granted Aug 21, 2012·8 cites·16 claims
- 0385US8355807B2Method and apparatus for using aerial image sensitivity to model mask errorsSYNOPSYS INC·Filed 2010·Granted Jan 15, 2013·5 cites·20 claims
- 0485US7934176B2Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profileSYNOPSYS INC·Filed 2010·Granted Apr 26, 2011·4 cites·21 claims
- 0584US7743357B2Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profileSYNOPSYS INC·Filed 2007·Granted Jun 22, 2010·6 cites·6 claims
- 0683US7454739B2Method and apparatus for determining an accurate photolithography process modelSYNOPSYS INC·Filed 2006·Granted Nov 18, 2008·7 cites·16 claims
- 0780US8812145B2Modeling mask errors using aerial image sensitivitySYNOPSYS INC·Filed 2013·Granted Aug 19, 2014·3 cites·15 claims
- 0880US8181128B2Method and apparatus for determining a photolithography process model which models the influence of topography variationsHUANG JENSHENG·Filed 2008·Granted May 15, 2012·6 cites·15 claims
- 0979US8631359B1System and technique for modeling resist profile change sensitivity at different heightsHUANG JENSHENG·Filed 2012·Granted Jan 14, 2014·6 cites·19 claims
- 1079US7707539B2Facilitating process model accuracy by modeling mask corner rounding effectsSYNOPSYS INC·Filed 2007·Granted Apr 27, 2010·4 cites·18 claims
- 1173US8255838B2Etch-aware OPC model calibration by using an etch bias filterXUE JING·Filed 2010·Granted Aug 28, 2012·3 cites·19 claims
- 1262US7491479B2Compensating for effects of topography variation by using a variable intensity-thresholdSYNOPSYS INC·Filed 2005·Granted Feb 17, 2009·2 cites·20 claims
- 1360US7727687B2Method and apparatus for determining whether a sub-resolution assist feature will printSYNOPSYS INC·Filed 2006·Granted Jun 1, 2010·1 cites·12 claims
- 1448US10852635B2Compact modeling for the negative tone development processesSYNOPSYS INC·Filed 2018·Granted Dec 1, 2020·0 cites·20 claims
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