Assignee
HUANG JENSHENG
US·3 granted patents·20 citations·filing 2008–2012
Top patents by PatentIndex Score
3 records- 0186US8250498B2Method and apparatus for calibrating a photolithography process model by using a process window parameterHUANG JENSHENG·Filed 2010·Granted Aug 21, 2012·8 cites·16 claims
- 0280US8181128B2Method and apparatus for determining a photolithography process model which models the influence of topography variationsHUANG JENSHENG·Filed 2008·Granted May 15, 2012·6 cites·15 claims
- 0379US8631359B1System and technique for modeling resist profile change sensitivity at different heightsHUANG JENSHENG·Filed 2012·Granted Jan 14, 2014·6 cites·19 claims
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