Inventor · disambiguated record
Tsuneo Numanami
Also filed as: NUMANAMI TSUNEO
6 granted patents·2 pending applications·22 citations·filing 2002–2016
76Inventor score
Top patents by PatentIndex Score
8 records- 0168US7344808B2Method of making photomask blank substratesSHINETSU CHEMICAL CO·Filed 2004·Granted Mar 18, 2008·10 cites·5 claims
- 0265US7351504B2Photomask blank substrate, photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 1, 2008·8 cites·7 claims
- 0350US7179567B2Phase shift mask blank, phase shift mask, and method of manufactureSHINETSU CHEMICAL CO·Filed 2003·Granted Feb 20, 2007·3 cites·15 claims
- 0438US7329475B2Method of selecting photomask blank substratesSHIN ESTU CHEMICAL CO LTD·Filed 2004·Granted Feb 12, 2008·0 cites·2 claims
- 0538US7070888B2Method of selecting photomask blank substratesNIKON CORP·Filed 2004·Granted Jul 4, 2006·0 cites·6 claims
- 0636US2017110355A1Substrate cleaning apparatus and method for cleaning substrate for substrate related to photomaskSHINETSU CHEMICAL CO·Filed 2016·Application pending·0 cites
- 0735US2003025216A1Phase shift mask blank, phase shift mask, and method of manufactureFiled 2002·Application pending·0 cites
- 0832US8956463B2Method for cleaning photomask-related substrate, cleaning method, and cleaning fluid supplying apparatusNUMANAMI TSUNEO·Filed 2009·Granted Feb 17, 2015·1 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →