Inventor · disambiguated record
Hako Botma
Also filed as: BOTMA HAKO
16 granted patents·1 pending application·134 citations·filing 2003–2013
92Inventor score
Top patents by PatentIndex Score
17 records- 0193US7432517B2Pulse modifier, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Oct 7, 2008·43 cites·27 claims
- 0285US7030958B2Optical attenuator device, radiation system and lithographic apparatus therewith and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Apr 18, 2006·31 cites·47 claims
- 0383US7326948B2Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 5, 2008·7 cites·25 claims
- 0483US7148952B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 12, 2006·24 cites·20 claims
- 0581US9785051B2Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devicesASML NETHERLANDS BV·Filed 2013·Granted Oct 10, 2017·5 cites·29 claims
- 0673US7333178B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Feb 19, 2008·3 cites·20 claims
- 0768US8576373B2Lithographic apparatus and methodBOTMA HAKO·Filed 2010·Granted Nov 5, 2013·2 cites·13 claims
- 0865US6924885B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Aug 2, 2005·10 cites·18 claims
- 0960US7507976B2Lithographic apparatus, beam delivery systems, prisms and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Mar 24, 2009·1 cites·17 claims
- 1051US8030628B2Pulse modifier, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Oct 4, 2011·3 cites·16 claims
- 1150US7116400B2Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 3, 2006·2 cites·28 claims
- 1249US7400381B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jul 15, 2008·2 cites·20 claims
- 1349US2007170376A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1448US7375353B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·0 cites·20 claims
- 1547US7312850B2Lithographic apparatus, illumination system, and optical element for rotating an intensity distributionASML NETHERLANDS BV·Filed 2004·Granted Dec 25, 2007·1 cites·18 claims
- 1646US7715101B2Electromagnetic radiation pulse duration control apparatus and methodASML NETHERLANDS BV·Filed 2007·Granted May 11, 2010·0 cites·17 claims
- 1736US7130023B2Lithographic apparatus, mirror element, device manufacturing method, and beam delivery systemASML NETHERLANDS BV·Filed 2003·Granted Oct 31, 2006·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →