Inventor · disambiguated record
Gisela Von Blanckenhagen
Also filed as: VON BLANCKENHAGEN GISELA
9 granted patents·2 pending applications·14 citations·filing 2011–2017
81Inventor score
Top patents by PatentIndex Score
11 records- 0178US10209411B2Multilayer mirrorZEISS CARL SMT GMBH·Filed 2016·Granted Feb 19, 2019·4 cites·16 claims
- 0275US9229331B2EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating methodZEISS CARL SMT GMBH·Filed 2014·Granted Jan 5, 2016·3 cites·14 claims
- 0370US9996005B2Reflective optical element and optical system for EUV lithographyZEISS CARL SMT GMBH·Filed 2013·Granted Jun 12, 2018·3 cites·17 claims
- 0466US9696632B2Mirror for the EUV wavelength range, method for producing such a mirror, and projection exposure apparatus comprising such a mirrorZEISS CARL SMT GMBH·Filed 2014·Granted Jul 4, 2017·1 cites·20 claims
- 0565US10061205B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·1 cites·20 claims
- 0663US8430514B2Reflective optical element and method for production of such an optical elementVON BLANCKENHAGEN GISELA·Filed 2012·Granted Apr 30, 2013·1 cites·15 claims
- 0762US8246182B2Reflective optical element and method for production of such an optical elementVON BLANCKENHAGEN GISELA·Filed 2011·Granted Aug 21, 2012·1 cites·45 claims
- 0849US9880476B2Method for producing a capping layer composed of silicon oxide on an EUV mirror, EUV mirror, and EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jan 30, 2018·0 cites·9 claims
- 0938US2012250144A1Reflective optical element and method for operating an euv lithography apparatusEHM DIRK HEINRICH·Filed 2012·Application pending·0 cites
- 1037US9494718B2Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objectiveMUELLENDER STEPHAN·Filed 2012·Granted Nov 15, 2016·0 cites·27 claims
- 1134US2017365371A1Euv multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirrorZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →