Inventor · disambiguated record
Noriyuki Hirayanagi
Also filed as: HIRAYANAGI NORIYUKI
27 granted patents·9 pending applications·594 citations·filing 1997–2009
97Inventor score
Top patents by PatentIndex Score
36 records- 0194US5981947AApparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methodsNIKON CORP·Filed 1998·Granted Nov 9, 1999·94 cites·55 claims
- 0289US6522519B1Electrostatic chucking device and methods for holding microlithographic sampleNIKON CORP·Filed 2000·Granted Feb 18, 2003·44 cites·37 claims
- 0388US5847813AMask holder for microlithography exposureNIKON CORP·Filed 1997·Granted Dec 8, 1998·70 cites·12 claims
- 0486US6171736B1Projection-microlithography alignment method utilizing mask with separate mask substratesNIKON CORP·Filed 1999·Granted Jan 9, 2001·55 cites·6 claims
- 0585US6632722B2Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising sameNIKON CORP·Filed 2002·Granted Oct 14, 2003·29 cites·9 claims
- 0685US6521900B1Alignment marks for charged-particle-beam microlithography, and alignment methods using sameNIKON CORP·Filed 2000·Granted Feb 18, 2003·39 cites·24 claims
- 0784US6627903B1Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising sameNIKON CORP·Filed 2000·Granted Sep 30, 2003·39 cites·30 claims
- 0884US6433346B1Electrostatic reticle chucks, charged-particle-beam microlithography apparatus and methods, and semiconductor-device manufacturing methods comprising sameNIKON CORP·Filed 2000·Granted Aug 13, 2002·29 cites·22 claims
- 0981US6447964B2Charged-particle-beam microlithography methods including chip-exposure sequences for reducing thermally induced lateral shift of exposure position on the substrateNIKON CORP·Filed 2001·Granted Sep 10, 2002·17 cites·20 claims
- 1080US6399945B1Backscattered-electron detection systems and associated methodsNIKON CORP·Filed 1999·Granted Jun 4, 2002·34 cites·21 claims
- 1179US6204509B1Projection-microlithography apparatus, masks, and related methods incorporating reticle-distortion measurement and correctionNIKON CORP·Filed 1998·Granted Mar 20, 2001·43 cites·44 claims
- 1278US7483123B2Substrate conveyor apparatus, substrate conveyance method and exposure apparatusNIKON CORP·Filed 2005·Granted Jan 27, 2009·5 cites·26 claims
- 1376US6180289B1Projection-microlithography mask with separate mask substratesNIKON CORP·Filed 1998·Granted Jan 30, 2001·29 cites·15 claims
- 1475US7433017B2Method of measuring the position of a mask surface along the height direction, exposure device, and exposure methodNIKON CORP·Filed 2005·Granted Oct 7, 2008·3 cites·20 claims
- 1573US6841402B1Alignment-mark detection methods and devices for charged-particle-beam microlithography, and microelectronic-device manufacturing methods comprising sameNIKON CORP·Filed 2000·Granted Jan 11, 2005·10 cites·10 claims
- 1665US6835511B2Methods and apparatus for detecting and correcting reticle deformations in microlithographyNIKON CORP·Filed 2002·Granted Dec 28, 2004·20 cites·36 claims
- 1764US7862961B2Mask and exposure apparatusNIKON CORP·Filed 2007·Granted Jan 4, 2011·1 cites·18 claims
- 1861US6429090B1Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising sameNIKON CORP·Filed 2000·Granted Aug 6, 2002·6 cites·16 claims
- 1960US6657207B2Charged-particle-beam microlithography apparatus and methods including optical corrections made during subfield exposuresNIKON CORP·Filed 2001·Granted Dec 2, 2003·7 cites·18 claims
- 2059US6909490B2Reticle chambers and reticle cassettes providing temperature control and ready exchange of reticles for exposureNIKON CORP·Filed 2002·Granted Jun 21, 2005·6 cites·26 claims
- 2155US6936831B2Divided reticles for charged-particle-beam microlithography apparatus, and methods for using sameNIKON CORP·Filed 2001·Granted Aug 30, 2005·4 cites·18 claims
- 2255US2009219504A1Substrate conveyor apparatus, substrate conveyance method and exposure apparatusNIKON CORP·Filed 2009·Application pending·0 cites
- 2349US8390783B2Method of measuring the position of a mask surface along the height direction, exposure device, and exposure methodHIRAYANAGI NORIYUKI·Filed 2008·Granted Mar 5, 2013·0 cites·20 claims
- 2449US6965114B2Apparatus and methods for mask/substrate alignment in charged-particle-beam pattern-transferNIKON CORP·Filed 2002·Granted Nov 15, 2005·1 cites·32 claims
- 2549US6627906B2Control of exposure in charged-particle-beam microlithography based on beam-transmissivity of the reticleNIKON CORP·Filed 2002·Granted Sep 30, 2003·1 cites·18 claims
- 2649US6627905B1Charged-particle-beam mask-based exposure apparatus employing a variable mask-illumination field and alignment and calibration methods thereforNIKON CORP·Filed 1998·Granted Sep 30, 2003·8 cites·9 claims
- 2745US2008024751A1Reticle holding member, reticle stage, exposure apparatus, projection-exposure method and device manufacturing methodNIKON CORP·Filed 2007·Application pending·0 cites
- 2840US2008225261A1Exposure apparatus and device manufacturing methodHIRAYANAGI NORIYUKI·Filed 2008·Application pending·0 cites
- 2939US8018577B2Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in sameNIKON CORP·Filed 2006·Granted Sep 13, 2011·0 cites·36 claims
- 3039US2003089863A1Beam-calibration methods for charged-particle-beam microlithography systemsNIKON CORP·Filed 2002·Application pending·0 cites
- 3136US2001016302A1Wafer chucks allowing controlled reduction of substrate heating and rapid substrate exchangeNIKON CORP·Filed 2000·Application pending·0 cites
- 3236US2002145714A1Reticle chucks and methods for holding a lithographic reticle utilizing sameNIKON CORP·Filed 2002·Application pending·0 cites
- 3333US2004126673A1Microlithography reticles including high-contrast reticle-identification codes, and apparatus and methods for identifying reticles based on such codesNIKON CORP·Filed 2003·Application pending·0 cites
- 3430US6750464B2Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detectorNIKON CORP·Filed 2001·Granted Jun 15, 2004·0 cites·30 claims
- 3530US2003010936A1Optically detectable alignment marks producing an enhanced signal-amplitude change from scanning of a detection light over the alignment mark, and associated alighment-detection methodsNIKON CORP·Filed 2002·Application pending·0 cites
- 3630US2003111618A1Methods and devices for detecting a distribution of charged-particle density of a charged-particle beam in charged-particle-beam microlithography systemsNIKON CORP·Filed 2002·Application pending·0 cites
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