Inventor · disambiguated record
Marina V. Plat
Also filed as: PLAT MARINA · PLAT MARINA V
68 granted patents·3 pending applications·1,746 citations·filing 1997–2011
99Inventor score
Files withADVANCED MICRO DEVICES INC65CLARIANT FINANCE BVI LTD1GHANDEHARI KOUROS1GLOBALFOUNDRIES INC1SPANSION LLC1
Top patents by PatentIndex Score
71 records- 0198US6773998B1Modified film stack and patterning strategy for stress compensation and prevention of pattern distortion in amorphous carbon gate patterningADVANCED MICRO DEVICES INC·Filed 2003·Granted Aug 10, 2004·208 cites·22 claims
- 0297US6383952B1RELACS process to double the frequency or pitch of small feature formationADVANCED MICRO DEVICES INC·Filed 2001·Granted May 7, 2002·140 cites·10 claims
- 0396US6541360B1Bi-layer trim etch process to form integrated circuit gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 1, 2003·101 cites·26 claims
- 0495US6534418B1Use of silicon containing imaging layer to define sub-resolution gate structuresADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·97 cites·20 claims
- 0594US6818141B1Application of the CVD bilayer ARC as a hard mask for definition of the subresolution trench features between polysilicon wordlinesADVANCED MICRO DEVICES INC·Filed 2002·Granted Nov 16, 2004·72 cites·19 claims
- 0691US6764949B2Method for reducing pattern deformation and photoresist poisoning in semiconductor device fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Jul 20, 2004·53 cites·18 claims
- 0790US6417084B1T-gate formation using a modified conventional poly processADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 9, 2002·50 cites·19 claims
- 0890US6306769B1Use of dual patterning masks for printing holes of small dimensionsADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 23, 2001·49 cites·12 claims
- 0989US6900002B1Antireflective bi-layer hardmask including a densified amorphous carbon layerADVANCED MICRO DEVICES INC·Filed 2002·Granted May 31, 2005·45 cites·7 claims
- 1088US6403456B1T or T/Y gate formation using trim etch processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Jun 11, 2002·48 cites·20 claims
- 1187US6589711B1Dual inlaid process using a bilayer resistADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 8, 2003·45 cites·30 claims
- 1287US6270929B1Damascene T-gate using a relacs flowADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 7, 2001·37 cites·20 claims
- 1386US7008832B1Damascene process for a T-shaped gate electrodeADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 7, 2006·40 cites·19 claims
- 1485US7538026B1Multilayer low reflectivity hard mask and process thereforADVANCED MICRO DEVICES INC·Filed 2005·Granted May 26, 2009·8 cites·23 claims
- 1585US6864556B1CVD organic polymer film for advanced gate patterningADVANCED MICRO DEVICES INC·Filed 2002·Granted Mar 8, 2005·30 cites·18 claims
- 1685US6548423B1Multilayer anti-reflective coating process for integrated circuit fabricationADVANCED MICRO DEVICES INC·Filed 2002·Granted Apr 15, 2003·32 cites·20 claims
- 1785US6358856B1Bright field image reversal for contact hole patterningADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 19, 2002·34 cites·13 claims
- 1881US6255202B1Damascene T-gate using a spacer flowADVANCED MICRO DEVICES INC·Filed 2000·Granted Jul 3, 2001·28 cites·20 claims
- 1979US6797552B1Method for defect reduction and enhanced control over critical dimensions and profiles in semiconductor devicesADVANCED MICRO DEVICES INC·Filed 2002·Granted Sep 28, 2004·22 cites·8 claims
- 2078US6635409B1Method of strengthening photoresist to prevent pattern collapseADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 21, 2003·16 cites·19 claims
- 2175US7052921B1System and method using in situ scatterometry to detect photoresist pattern integrity during the photolithography processADVANCED MICRO DEVICES INC·Filed 2004·Granted May 30, 2006·16 cites·12 claims
- 2275US6255125B1Method and apparatus for compensating for critical dimension variations in the production of a semiconductor waferADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 3, 2001·47 cites·13 claims
- 2374US6867097B1Method of making a memory cell with polished insulator layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Mar 15, 2005·45 cites·10 claims
- 2473US7427457B1Methods for designing grating structures for use in situ scatterometry to detect photoresist defectsADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 23, 2008·11 cites·27 claims
- 2573US6262435B1Etch bias distribution across semiconductor waferFiled 1998·Granted Jul 17, 2001·36 cites·6 claims
- 2672US6313019B1Y-gate formation using damascene processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 6, 2001·17 cites·20 claims
- 2771US7112489B1Negative resist or dry develop process for forming middle of line implant layerADVANCED MICRO DEVICES INC·Filed 2004·Granted Sep 26, 2006·13 cites·8 claims
- 2871US6803178B1Two mask photoresist exposure pattern for dense and isolated regionsADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 12, 2004·16 cites·35 claims
- 2971US6365509B1Semiconductor manufacturing method using a dielectric photomaskADVANCED MICRO DEVICES INC·Filed 2000·Granted Apr 2, 2002·18 cites·12 claims
- 3070US6660645B1Process for etching an organic dielectric using a silyated photoresist maskADVANCED MICRO DEVICES INC·Filed 2002·Granted Dec 9, 2003·12 cites·15 claims
- 3170US6057206AMark protection scheme with no maskingADVANCED MICRO DEVICES INC·Filed 1999·Granted May 2, 2000·36 cites·11 claims
- 3269US6753266B1Method of enhancing gate patterning properties with reflective hard maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Jun 22, 2004·12 cites·19 claims
- 3369US6737222B2Dual damascene process utilizing a bi-layer imaging layerADVANCED MICRO DEVICES INC·Filed 2001·Granted May 18, 2004·12 cites·20 claims
- 3468US6828259B2Enhanced transistor gate using E-beam radiationADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 7, 2004·16 cites·20 claims
- 3567US6606738B1Analytical model for predicting the operating process window for lithographic patterning techniques based on photoresist trim technologyADVANCED MICRO DEVICES INC·Filed 2001·Granted Aug 12, 2003·13 cites·12 claims
- 3667US6558965B1Measuring BARC thickness using scatterometryADVANCED MICRO DEVICES INC·Filed 2001·Granted May 6, 2003·10 cites·14 claims
- 3767US6420280B2Method and system for reducing ARC layer removal by providing a capping layer for the ARC layerADVANCED MICRO DEVICES INC·Filed 2001·Granted Jul 16, 2002·9 cites·8 claims
- 3865US6913958B1Method for patterning a feature using a trimmed hardmaskADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 5, 2005·9 cites·5 claims
- 3965US6764947B1Method for reducing gate line deformation and reducing gate line widths in semiconductor devicesADVANCED MICRO DEVICES INC·Filed 2003·Granted Jul 20, 2004·9 cites·13 claims
- 4065US6689682B1Multilayer anti-reflective coating for semiconductor lithographyADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 10, 2004·9 cites·6 claims
- 4165US6458691B1Dual inlaid process using an imaging layer to protect via from poisoningADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 1, 2002·12 cites·29 claims
- 4263US6900124B1Patterning for elliptical Vss contact on flash memoryADVANCED MICRO DEVICES INC·Filed 2003·Granted May 31, 2005·9 cites·10 claims
- 4363US6849530B2Method for semiconductor gate line dimension reductionADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 1, 2005·10 cites·6 claims
- 4463US6319802B1T-gate formation using modified damascene processing with two masksADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 20, 2001·10 cites·20 claims
- 4563US6222241B1Method and system for reducing ARC layer removal by providing a capping layer for the ARC layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 24, 2001·22 cites·5 claims
- 4662US6458606B2Etch bias distribution across semiconductor waferADVANCED MICRO DEVICES INC·Filed 2001·Granted Oct 1, 2002·6 cites·18 claims
- 4761US6563221B1Connection structures for integrated circuits and processes for their formationADVANCED MICRO DEVICES INC·Filed 2002·Granted May 13, 2003·9 cites·17 claims
- 4860US7122455B1Patterning with rigid organic under-layerADVANCED MICRO DEVICES INC·Filed 2004·Granted Oct 17, 2006·8 cites·9 claims
- 4960US6448164B1Dark field image reversal for gate or line patterningADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 10, 2002·9 cites·10 claims
- 5060US6326231B1Use of silicon oxynitride ARC for metal layersADVANCED MICRO DEVICES INC·Filed 1998·Granted Dec 4, 2001·23 cites·20 claims
Showing the top 50 of 71 patent records by PatentIndex Score.
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