Inventor · disambiguated record
Stephen E. Savas
Also filed as: SAVAS STEPHEN · SAVAS STEPHEN E · SAVAS STEPHEN EDWARD
62 granted patents·22 pending applications·2,383 citations·filing 1991–2023
99Inventor score
Top patents by PatentIndex Score
84 records- 0198US12002652B2Variable mode plasma chamber utilizing tunable plasma potentialMATTSON TECH INC·Filed 2021·Granted Jun 4, 2024·4 cites·13 claims
- 0297US11670488B2Fast arc detecting match networkCOMET TECHNOLOGIES USA INC·Filed 2021·Granted Jun 6, 2023·7 cites·20 claims
- 0397US11605527B2Pulsing control match networkCOMET TECHNOLOGIES USA INC·Filed 2021·Granted Mar 14, 2023·7 cites·11 claims
- 0497US6253704B1Apparatus and method for pulsed plasma processing of a semiconductor substrateMATTSON TECH INC·Filed 1999·Granted Jul 3, 2001·117 cites·26 claims
- 0597US6143129AInductive plasma reactorMATTSON TECH INC·Filed 1998·Granted Nov 7, 2000·374 cites·35 claims
- 0697US5811022AInductive plasma reactorMATTSON TECH INC·Filed 1994·Granted Sep 22, 1998·282 cites·57 claims
- 0797US5534231ALow frequency inductive RF plasma reactorMATTSON TECH INC·Filed 1995·Granted Jul 9, 1996·142 cites·114 claims
- 0896US6805139B1Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturingMATTSON TECH INC·Filed 2000·Granted Oct 19, 2004·138 cites·28 claims
- 0996US6551447B1Inductive plasma reactorMATTSON TECH INC·Filed 2000·Granted Apr 22, 2003·113 cites·31 claims
- 1096US5983828AApparatus and method for pulsed plasma processing of a semiconductor substrateMATTSON TECH INC·Filed 1996·Granted Nov 16, 1999·123 cites·46 claims
- 1195US6794301B2Pulsed plasma processing of semiconductor substratesMATTSON TECH INC·Filed 2002·Granted Sep 21, 2004·64 cites·39 claims
- 1295US6395641B2Apparatus and method for pulsed plasma processing of a semiconductor substrateMATTSON TECHONOLGY INC·Filed 2001·Granted May 28, 2002·92 cites·18 claims
- 1394US8697197B2Methods for plasma processingSAVAS STEPHEN EDWARD·Filed 2010·Granted Apr 15, 2014·23 cites·31 claims
- 1494US5225024AMagnetically enhanced plasma reactor system for semiconductor processingAPPLIED MATERIALS INC·Filed 1991·Granted Jul 6, 1993·140 cites·9 claims
- 1594US5102496AParticulate contamination prevention using low power plasmaAPPLIED MATERIALS INC·Filed 1991·Granted Apr 7, 1992·90 cites·24 claims
- 1692US11189464B2Variable mode plasma chamber utilizing tunable plasma potentialMATTSON TECH INC·Filed 2019·Granted Nov 30, 2021·5 cites·20 claims
- 1792US10544519B2Method and apparatus for surface preparation prior to epitaxial depositionAIXTRON SE·Filed 2017·Granted Jan 28, 2020·8 cites·20 claims
- 1892US9721759B1System and method for distributing RF power to a plasma sourceAIXTRON SE·Filed 2016·Granted Aug 1, 2017·14 cites·16 claims
- 1991US11348784B2Enhanced ignition in inductively coupled plasmas for workpiece processingMATTSON TECH INC·Filed 2019·Granted May 31, 2022·4 cites·18 claims
- 2090US5964949AICP reactor having a conically-shaped plasma-generating sectionMATTSON TECH INC·Filed 1997·Granted Oct 12, 1999·67 cites·34 claims
- 2189US6355909B1Method and apparatus for thermal processing of semiconductor substratesSANDIA CORP·Filed 2000·Granted Mar 12, 2002·43 cites·20 claims
- 2289US6342691B1Apparatus and method for thermal processing of semiconductor substratesMATTSON TECH INC·Filed 1999·Granted Jan 29, 2002·111 cites·35 claims
- 2389US6198074B1System and method for rapid thermal processing with transitional heaterMATTSON TECH INC·Filed 1997·Granted Mar 6, 2001·89 cites·57 claims
- 2487US11251075B2Systems and methods for workpiece processing using neutral atom beamsMATTSON TECH INC·Filed 2018·Granted Feb 15, 2022·4 cites·17 claims
- 2586US9184072B2Advanced multi-workpiece processing chamberDEVINE DANIEL J·Filed 2007·Granted Nov 10, 2015·16 cites·45 claims
- 2686US8236706B2Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structuresPEUSE BRUCE W·Filed 2008·Granted Aug 7, 2012·14 cites·11 claims
- 2785US7361605B2System and method for removal of photoresist and residues following contact etch with a stop layer presentMATTSON TECH INC·Filed 2005·Granted Apr 22, 2008·12 cites·23 claims
- 2884US11830708B2Inductive broad-band sensors for electromagnetic wavesCOMET TECHNOLOGIES USA INC·Filed 2021·Granted Nov 28, 2023·1 cites·20 claims
- 2984US11049692B2Methods for tuning plasma potential using variable mode plasma chamberMATTSON TECH INC·Filed 2019·Granted Jun 29, 2021·3 cites·18 claims
- 3084US9852887B2Ion source of an ion implanterADVANCED ION BEAM TECH INC·Filed 2013·Granted Dec 26, 2017·6 cites·68 claims
- 3184US7232767B2Slotted electrostatic shield modification for improved etch and CVD process uniformityMATTSON TECH INC·Filed 2004·Granted Jun 19, 2007·25 cites·20 claims
- 3284US6706142B2Systems and methods for enhancing plasma processing of a semiconductor substrateMATTSON TECH INC·Filed 2001·Granted Mar 16, 2004·35 cites·22 claims
- 3383US12347677B2Enhanced ignition in inductively coupled plasmas for workpiece processingBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2023·Granted Jul 1, 2025·0 cites·15 claims
- 3483US12027351B2Plasma non-uniformity detectionCOMET TECHNOLOGIES USA INC·Filed 2021·Granted Jul 2, 2024·1 cites·20 claims
- 3581US9443702B2Methods for plasma processingAIXTRON SE·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 3681US9096933B2Methods for plasma processingAIXTRON INC·Filed 2014·Granted Aug 4, 2015·3 cites·21 claims
- 3781US6331697B2System and method for rapid thermal processingMATTSON TECH INC·Filed 2001·Granted Dec 18, 2001·23 cites·11 claims
- 3880US6838387B1Fast etching system and processFiled 2001·Granted Jan 4, 2005·23 cites·2 claims
- 3978US12505984B2Pulsing control match network and generatorCOMET TECHNOLOGIES USA INC·Filed 2023·Granted Dec 23, 2025·0 cites·8 claims
- 4078US11848204B2Enhanced ignition in inductively coupled plasmas for workpiece processingBEIJING E TOWN SEMICONDUCTOR TECH CO LTD·Filed 2022·Granted Dec 19, 2023·0 cites·7 claims
- 4177US6133550AMethod and apparatus for thermal processing of semiconductor substratesSANDIA CORP·Filed 1998·Granted Oct 17, 2000·44 cites·69 claims
- 4276US6379576B2Systems and methods for variable mode plasma enhanced processing of semiconductor wafersMATTSON TECH INC·Filed 1998·Granted Apr 30, 2002·47 cites·40 claims
- 4375US12272532B2Inductive broad-band sensors for electromagnetic wavesCOMET TECHNOLOGIES USA INC·Filed 2023·Granted Apr 8, 2025·0 cites·18 claims
- 4475US2023260755A1Fast arc detecting match networkCOMET TECHNOLOGIES USA INC·Filed 2023·Application pending·0 cites
- 4574US7534362B2Uniform etching system and process for large rectangular substratesSAVAS STEPHEN E·Filed 2005·Granted May 19, 2009·5 cites·7 claims
- 4672US7799685B2System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturingMATTSON TECH INC·Filed 2004·Granted Sep 21, 2010·16 cites·23 claims
- 4771US9831466B2Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrierAIXTRON SE·Filed 2014·Granted Nov 28, 2017·2 cites·29 claims
- 4871US8765232B2Apparatus and method for dielectric depositionSAVAS STEPHEN EDWARD·Filed 2012·Granted Jul 1, 2014·2 cites·20 claims
- 4970US9299956B2Method for deposition of high-performance coatings and encapsulated electronic devicesAIXTRON INC·Filed 2013·Granted Mar 29, 2016·2 cites·21 claims
- 5070US9096932B2Methods for plasma processingAIXTRON INC·Filed 2014·Granted Aug 4, 2015·1 cites·34 claims
Showing the top 50 of 84 patent records by PatentIndex Score.
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