Inventor · disambiguated record
Todd Hiar
Also filed as: HIAR TODD · HIAR TODD D · HIAR TODD DAVID
8 granted patents·2 pending applications·104 citations·filing 2003–2011
85Inventor score
Top patents by PatentIndex Score
10 records- 0192US6873938B1Adaptive lithographic critical dimension enhancementASML NETHERLANDS BV·Filed 2003·Granted Mar 29, 2005·61 cites·30 claims
- 0290US7781149B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2006·Granted Aug 24, 2010·16 cites·33 claims
- 0382US7738075B2Lithographic attribute enhancementASML NETHERLANDS BV·Filed 2005·Granted Jun 15, 2010·7 cites·29 claims
- 0480US7906270B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Mar 15, 2011·6 cites·31 claims
- 0568US7274429B2Integrated lithographic fabrication clusterASML NETHERLANDS BV·Filed 2003·Granted Sep 25, 2007·11 cites·29 claims
- 0661US8937705B2Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting deviceTEL WIM TJIBBO·Filed 2009·Granted Jan 20, 2015·1 cites·26 claims
- 0748US7019268B2Wafer processing apparatus and method of useASML NETHERLANDS BV·Filed 2004·Granted Mar 28, 2006·2 cites·23 claims
- 0848US2011244401A1Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2011·Application pending·0 cites
- 0948US2007046917A1Lithographic apparatus and device manufacturing method that compensates for reticle induced CDUASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1047US7981595B2Reduced pitch multiple exposure processASML NETHERLANDS BV·Filed 2005·Granted Jul 19, 2011·0 cites·32 claims
Join the waitlist — get patent alerts
Get an alert when Todd Hiar files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →