Inventor · disambiguated record
Seyed Jafar Jafarian-Tehrani
Also filed as: JAFARIAN-TEHRANI SEYED J · JAFARIAN-TEHRANI SEYED JAFAR
26 granted patents·5 pending applications·484 citations·filing 1996–2025
96Inventor score
Files withLAM RES CORP22LONG MAOLIN3JAFARIAN-TEHRANI SEYED JAFAR2BOOTH JEAN-PAUL1LAM RES CORP A DELAWARE CORP1
Top patents by PatentIndex Score
31 records- 0196US9720022B2Systems and methods for providing characteristics of an impedance matching model for use with matching networksLAM RES CORP·Filed 2015·Granted Aug 1, 2017·21 cites·25 claims
- 0295US9620334B2Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2014·Granted Apr 11, 2017·20 cites·23 claims
- 0393US6873114B2Method for toolmatching and troubleshooting a plasma processing systemLAM RES CORP·Filed 2003·Granted Mar 29, 2005·45 cites·18 claims
- 0490US10381201B2Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2017·Granted Aug 13, 2019·5 cites·18 claims
- 0589US6563076B1Voltage control sensor and control interface for radio frequency power regulation in a plasma reactorLAM RES CORP·Filed 2000·Granted May 13, 2003·30 cites·41 claims
- 0688US6509542B1Voltage control sensor and control interface for radio frequency power regulation in a plasma reactorLAM RES CORP·Filed 2000·Granted Jan 21, 2003·28 cites·46 claims
- 0787US5824606AMethods and apparatuses for controlling phase difference in plasma processing systemsLAM RES CORP·Filed 1996·Granted Oct 20, 1998·75 cites·16 claims
- 0887US5812361ADynamic feedback electrostatic wafer chuckLAM RES CORP·Filed 1996·Granted Sep 22, 1998·97 cites·23 claims
- 0982US5708250AVoltage controller for electrostatic chuck of vacuum plasma processorsLAM RESARCH CORP·Filed 1996·Granted Jan 13, 1998·82 cites·21 claims
- 1081US7435926B2Methods and array for creating a mathematical model of a plasma processing systemLAM RES CORP·Filed 2004·Granted Oct 14, 2008·42 cites·21 claims
- 1181US6919689B2Method for toolmatching and troubleshooting a plasma processing systemLAM RES CORP·Filed 2003·Granted Jul 19, 2005·16 cites·21 claims
- 1278US8736175B2Current control in plasma processing systemsLONG MAOLIN·Filed 2010·Granted May 27, 2014·4 cites·21 claims
- 1376US12217944B2High power cable for heated components in RF environmentLAM RES CORP·Filed 2023·Granted Feb 4, 2025·0 cites·15 claims
- 1476US11837446B2High power cable for heated components in RF environmentLAM RES CORP·Filed 2018·Granted Dec 5, 2023·2 cites·8 claims
- 1575US7768766B2Plasma processing system ESC high voltage controlLAM RES CORP·Filed 2007·Granted Aug 3, 2010·4 cites·29 claims
- 1672US7983018B2Plasma processing system ESC high voltage control and methods thereofLAM RES CORP·Filed 2010·Granted Jul 19, 2011·2 cites·20 claims
- 1771US9074285B2Systems for detecting unconfined-plasma eventsPEASE JOHN·Filed 2008·Granted Jul 7, 2015·6 cites·12 claims
- 1868US9305750B2Adjusting current ratios in inductively coupled plasma processing systemsLONG MAOLIN·Filed 2010·Granted Apr 5, 2016·2 cites·14 claims
- 1967US2025183015A1High power cable for heated components in rf environmentLAM RES CORP·Filed 2025·Application pending·0 cites
- 2065US9312832B2High power filter with single adjust for multiple channelsLAM RES CORP·Filed 2014·Granted Apr 12, 2016·2 cites·19 claims
- 2165US8894804B2Plasma unconfinement sensor and methods thereofBOOTH JEAN-PAUL·Filed 2008·Granted Nov 25, 2014·1 cites·29 claims
- 2258US10690727B2Identifying components associated with a fault in a plasma systemLAM RES CORP·Filed 2017·Granted Jun 23, 2020·0 cites·13 claims
- 2358US2025349515A1Rf and dc frequency and phase locked pulsed edge tilt control systemLAM RES CORP·Filed 2023·Application pending·0 cites
- 2453US9851389B2Identifying components associated with a fault in a plasma systemLAM RES CORP·Filed 2015·Granted Dec 26, 2017·0 cites·24 claims
- 2552US2024355588A1Substrate processing system including rf matching circuit for multi-frequency, multi-level, multi-state pulsingLAM RES CORP·Filed 2022·Application pending·0 cites
- 2651US2005151479A1Method for toolmatching and troubleshooting a plasma processing systemLAM RES CORP A DELAWARE CORP·Filed 2005·Application pending·0 cites
- 2745US8315029B2ESC high voltage control and methods thereofJAFARIAN-TEHRANI SEYED JAFAR·Filed 2011·Granted Nov 20, 2012·0 cites·20 claims
- 2844US10812033B2High-power radio-frequency spiral-coil filterLAM RES CORP·Filed 2018·Granted Oct 20, 2020·0 cites·24 claims
- 2942US2019318919A1Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2019·Application pending·0 cites
- 3039US8466697B2Arrangements for detecting discontinuity of flexible connections for current flow and methods thereofJAFARIAN-TEHRANI SEYED JAFAR·Filed 2009·Granted Jun 18, 2013·0 cites·17 claims
- 3137US8742666B2Radio frequency (RF) power filters and plasma processing systems including RF power filtersLONG MAOLIN·Filed 2010·Granted Jun 3, 2014·0 cites·14 claims
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