Inventor · disambiguated record
Frederik Eduard De Jong
Also filed as: DE JONG FREDERIK EDUARD
21 granted patents·2 pending applications·90 citations·filing 2004–2023
94Inventor score
Files withASML NETHERLANDS BV18CADEE THEODORUS PETRUS MARIA2AARTS IGOR MATHEUS PETRONELLA1DE JONG FREDERIK EDUARD1WIJCKMANS MAURICE1
Top patents by PatentIndex Score
23 records- 0196US7804575B2Lithographic apparatus and device manufacturing method having liquid evaporation controlASML NETHERLANDS BV·Filed 2005·Granted Sep 28, 2010·23 cites·44 claims
- 0294US11378893B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 0390US7462429B2Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrateASML NETHERLANDS BV·Filed 2005·Granted Dec 9, 2008·9 cites·11 claims
- 0489US9188880B2Lithographic apparatus and device manufacturing method involving a heaterCADEE THEODORUS PETRUS MARIA·Filed 2011·Granted Nov 17, 2015·4 cites·32 claims
- 0588US9268242B2Lithographic apparatus and device manufacturing method involving a heater and a temperature sensorCADEE THEODORUS PETRUS MARIA·Filed 2010·Granted Feb 23, 2016·4 cites·38 claims
- 0686US10838310B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2019·Granted Nov 17, 2020·1 cites·20 claims
- 0785US7710539B2Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor deviceASML NETHERLANDS BV·Filed 2008·Granted May 4, 2010·5 cites·15 claims
- 0882US7462430B2Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor deviceASML NETHERLANDS BV·Filed 2006·Granted Dec 9, 2008·4 cites·13 claims
- 0981US7423725B2Lithographic methodASML NETHERLANDS BV·Filed 2006·Granted Sep 9, 2008·5 cites·31 claims
- 1076US12204252B2Method for decision making in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2023·Granted Jan 21, 2025·0 cites·20 claims
- 1176US11687007B2Method for decision making in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Jun 27, 2023·1 cites·20 claims
- 1273US8514365B2Lithographic apparatus and device manufacturing methodDE JONG FREDERIK EDUARD·Filed 2007·Granted Aug 20, 2013·5 cites·20 claims
- 1373US8264671B2Lithographic apparatus and device manufacturing methodAARTS IGOR MATHEUS PETRONELLA·Filed 2009·Granted Sep 11, 2012·5 cites·14 claims
- 1473US7710538B2Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrateASML NETHERLANDS BV·Filed 2008·Granted May 4, 2010·2 cites·12 claims
- 1571US7196768B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Mar 27, 2007·14 cites·12 claims
- 1667US7746447B2Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Jun 29, 2010·2 cites·8 claims
- 1765US7426011B2Method of calibrating a lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 16, 2008·2 cites·25 claims
- 1863US10254663B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2015·Granted Apr 9, 2019·0 cites·38 claims
- 1962US8913228B2Lithographic apparatus and device manufacturing methodWIJCKMANS MAURICE·Filed 2007·Granted Dec 16, 2014·2 cites·39 claims
- 2059US11774869B2Method and system for determining overlayASML NETHERLANDS BV·Filed 2020·Granted Oct 3, 2023·0 cites·14 claims
- 2150US2024280907A1Method and arrangement for determining thermally-induced deformationsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2249US8384881B2Lithographic apparatus, stage apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2008·Granted Feb 26, 2013·0 cites·21 claims
- 2333US2019384164A1Method of determining pellicle degradation compensation corrections, and associated lithographic apparatus and computer programASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →