Inventor · disambiguated record
Johannes Anna Quaedackers
Also filed as: QUAEDACKERS JOHANNES ANNA
26 granted patents·5 pending applications·94 citations·filing 2005–2020
95Inventor score
Files withASML NETHERLANDS BV13MITUTOYO CORP10CADEE THEODORUS PETRUS MARIA2MEGENS HENRICUS JOHANNES LAMBERTUS2LEEWIS CHRISTIAN MARINUS1
Top patents by PatentIndex Score
31 records- 0196US7804575B2Lithographic apparatus and device manufacturing method having liquid evaporation controlASML NETHERLANDS BV·Filed 2005·Granted Sep 28, 2010·23 cites·44 claims
- 0294US11378893B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2020·Granted Jul 5, 2022·2 cites·20 claims
- 0389US9188880B2Lithographic apparatus and device manufacturing method involving a heaterCADEE THEODORUS PETRUS MARIA·Filed 2011·Granted Nov 17, 2015·4 cites·32 claims
- 0488US9436099B2Lithographic focus and dose measurement using a 2-D targetASML NETHERLANDS BV·Filed 2014·Granted Sep 6, 2016·5 cites·11 claims
- 0588US9268242B2Lithographic apparatus and device manufacturing method involving a heater and a temperature sensorCADEE THEODORUS PETRUS MARIA·Filed 2010·Granted Feb 23, 2016·4 cites·38 claims
- 0686US10838310B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2019·Granted Nov 17, 2020·1 cites·20 claims
- 0785US8891061B2Lithographic focus and dose measurement using a 2-D targetLEEWIS CHRISTIAN MARINUS·Filed 2009·Granted Nov 18, 2014·10 cites·18 claims
- 0884US7992115B2Overlay measurement on double patterning substrateASML NETHERLANDS BV·Filed 2008·Granted Aug 2, 2011·12 cites·9 claims
- 0984US7670731B2Method for exposing a substrate and lithographic projection apparatusASML NETHERLANDS BV·Filed 2006·Granted Mar 2, 2010·7 cites·14 claims
- 1084US7596420B2Device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2006·Granted Sep 29, 2009·7 cites·20 claims
- 1183US9881400B2Method for measuring a high accuracy height map of a test surfaceMITUTOYO CORP·Filed 2015·Granted Jan 30, 2018·9 cites·20 claims
- 1277US9103651B2Method and apparatus for determining a property of a surfaceMITUTOYO CORP·Filed 2013·Granted Aug 11, 2015·3 cites·18 claims
- 1368US10636157B2Method and system for calculating a height map of a surface of an object from an image stack in scanning optical 2.5D profiling of the surface by an optical systemMITUTOYO CORP·Filed 2018·Granted Apr 28, 2020·1 cites·19 claims
- 1467US10794688B2Optical interference measuring deviceMITUTOYO CORP·Filed 2019·Granted Oct 6, 2020·1 cites·11 claims
- 1565US7307687B2Lithographic apparatus, device manufacturing method and substrateASML NETHERLANDS BV·Filed 2006·Granted Dec 11, 2007·2 cites·14 claims
- 1664US10302415B2Method for calculating a height map of a body of transparent material having an inclined or curved surfaceMITUTOYO CORP·Filed 2015·Granted May 28, 2019·1 cites·11 claims
- 1763US10254663B2Lithographic apparatus and device manufacturing method involving a heaterASML NETHERLANDS BV·Filed 2015·Granted Apr 9, 2019·0 cites·38 claims
- 1862US10563974B2Method for measuring a height map of multiple fields of view and combining them to a composite height map with minimized sensitivity to instrument driftMITUTOYO CORP·Filed 2016·Granted Feb 18, 2020·1 cites·12 claims
- 1955US2014199634A1Method of Measuring a CharacteristicASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 2054US8502955B2Method of determining a characteristicMEGENS HENRICUS JOHANNES LAMBERTUS·Filed 2009·Granted Aug 6, 2013·1 cites·12 claims
- 2151US2018031415A1Interferometer system having a continuously variable broadband reflector and method to generate an interference signal of a surface of a sampleMITUTOYO CORP·Filed 2017·Application pending·0 cites
- 2250US2014362383A1Interferometer system and method to generate an interference signal of a surface of a sampleMITUTOYO CORP·Filed 2014·Application pending·0 cites
- 2349US10024648B2Interference measuring device and method of measurement using the same deviceMITUTOYO CORP·Filed 2017·Granted Jul 17, 2018·0 cites·11 claims
- 2448US11466976B2Method and system for measuring a height map of a surface of an object, and computer program thereforMITUTOYO CORP·Filed 2019·Granted Oct 11, 2022·0 cites·22 claims
- 2544US8685626B2Method of measuring a characteristicQUAEDACKERS JOHANNES ANNA·Filed 2010·Granted Apr 1, 2014·0 cites·12 claims
- 2644US2008160458A1Lithographic device manufacturing method, lithographic cell, and computer program productASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 2743US8982328B2Method and apparatus for overlay measurementMEGENS HENRICUS JOHANNES LAMBERTUS·Filed 2010·Granted Mar 17, 2015·0 cites·18 claims
- 2843US7382438B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Jun 3, 2008·0 cites·18 claims
- 2936US8119333B2Lithographic methodVAN DER HEIJDEN EDDY CORNELIS ANTONIUS·Filed 2008·Granted Feb 21, 2012·0 cites·20 claims
- 3034US8435593B2Method of inspecting a substrate and method of preparing a substrate for lithographyVANGHELUWE RIK TEODOOR·Filed 2007·Granted May 7, 2013·0 cites·20 claims
- 3133US2010328636A1Producing a Marker Pattern and Measurement of an Exposure-Related Property of an Exposure ApparatusASML NETHERLANDS BV·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →