Inventor · disambiguated record
Jeffrey W. Anthis
Also filed as: ANTHIS JEFFREY · ANTHIS JEFFREY W
75 granted patents·24 pending applications·2,026 citations·filing 2011–2025
99Inventor score
Files withAPPLIED MATERIALS INC82THOMPSON DAVID7VARIAN SEMICONDUCTOR EQUIPMENT ASS INC3ANTHIS JEFFREY W1APPLIED MATEIALS INC1
Top patents by PatentIndex Score
99 records- 0198US10121671B2Methods of depositing metal films using metal oxyhalide precursorsAPPLIED MATERIALS INC·Filed 2016·Granted Nov 6, 2018·429 cites·20 claims
- 0298US10083834B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2017·Granted Sep 25, 2018·64 cites·15 claims
- 0398US9711366B2Selective etch for metal-containing materialsAPPLIED MATERIALS INC·Filed 2016·Granted Jul 18, 2017·115 cites·13 claims
- 0498US9472417B2Plasma-free metal etchAPPLIED MATERIALS INC·Filed 2014·Granted Oct 18, 2016·138 cites·9 claims
- 0598US9449843B1Selectively etching metals and metal nitrides conformallyAPPLIED MATERIALS INC·Filed 2015·Granted Sep 20, 2016·399 cites·15 claims
- 0698US9309598B2Oxide and metal removalAPPLIED MATERIALS INC·Filed 2014·Granted Apr 12, 2016·560 cites·18 claims
- 0798US9299582B2Selective etch for metal-containing materialsAPPLIED MATERIALS INC·Filed 2014·Granted Mar 29, 2016·154 cites·8 claims
- 0897US10465294B2Oxide and metal removalAPPLIED MATERIALS INC·Filed 2016·Granted Nov 5, 2019·25 cites·17 claims
- 0996US10790287B2Reducing gate induced drain leakage in DRAM wordlineAPPLIED MATERIALS INC·Filed 2018·Granted Sep 29, 2020·12 cites·10 claims
- 1095US9528183B2Cobalt removal for chamber clean or pre-clean processAPPLIED MATERIALS INC·Filed 2014·Granted Dec 27, 2016·25 cites·11 claims
- 1195US8821986B2Activated silicon precursors for low temperature depositionWEIDMAN TIMOTHY W·Filed 2012·Granted Sep 2, 2014·19 cites·20 claims
- 1294US10738008B2Nitrogen-containing ligands and their use in atomic layer deposition methodsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 11, 2020·3 cites·7 claims
- 1394US9768013B2Apparatus and method for selective depositionAPPLIED MATERIALS INC·Filed 2016·Granted Sep 19, 2017·10 cites·7 claims
- 1493US9390940B2Methods of etching films comprising transition metalsAPPLIED MATERIALS INC·Filed 2014·Granted Jul 12, 2016·13 cites·17 claims
- 1592US10036089B2Methods of depositing a metal alloy filmAPPLIED MATERIALS INC·Filed 2014·Granted Jul 31, 2018·6 cites·13 claims
- 1691US11552082B2Reducing gate induced drain leakage in DRAM wordlineAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·2 cites·10 claims
- 1791US10906925B2Ruthenium precursors for ALD and CVD thin film deposition and uses thereofAPPLIED MATERIALS INC·Filed 2020·Granted Feb 2, 2021·2 cites·8 claims
- 1890US10577386B2Ruthenium precursors for ALD and CVD thin film deposition and uses thereofAPPLIED MATERIALS INC·Filed 2017·Granted Mar 3, 2020·2 cites·11 claims
- 1987US11946135B2Low temperature deposition of iridium containing filmsAPPLIED MATERIALS INC·Filed 2023·Granted Apr 2, 2024·0 cites·14 claims
- 2087US9580799B2Nitrogen-containing ligands and their use in atomic layer deposition methodsAPPLIED MATERIALS INC·Filed 2013·Granted Feb 28, 2017·2 cites·7 claims
- 2187US8778816B2In situ vapor phase surface activation of SiO2SATO TATSUYA E·Filed 2011·Granted Jul 15, 2014·9 cites·19 claims
- 2287US2024200188A1Low temperature deposition of iridium containing filmsAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 2386US9540736B2Methods of etching films with reduced surface roughnessAPPLIED MATERIALS INC·Filed 2015·Granted Jan 10, 2017·2 cites·19 claims
- 2486US9145612B2Deposition of N-metal films comprising aluminum alloysAPPLIED MATERIALS INC·Filed 2013·Granted Sep 29, 2015·3 cites·18 claims
- 2585US10096514B2Seamless trench fill using deposition/etch techniquesAPPLIED MATERIALS INC·Filed 2017·Granted Oct 9, 2018·4 cites·20 claims
- 2685US8927059B2Deposition of metal films using alane-based precursorsAPPLIED MATERIALS INC·Filed 2012·Granted Jan 6, 2015·6 cites·19 claims
- 2783US9896770B2Methods of etching films with reduced surface roughnessAPPLIED MATERIALS INC·Filed 2016·Granted Feb 20, 2018·2 cites·16 claims
- 2883US8734902B2Precursors and methods for the atomic layer deposition of manganeseTHOMPSON DAVID·Filed 2012·Granted May 27, 2014·2 cites·20 claims
- 2981US10199215B2Apparatus and method for selective depositionAPPLIED MATERIALS INC·Filed 2017·Granted Feb 5, 2019·2 cites·13 claims
- 3081US10000853B2System and method for controllable non-volatile metal removalVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Jun 19, 2018·2 cites·11 claims
- 3180US9328415B2Methods for the deposition of manganese-containing films using diazabutadiene-based precursorsAPPLIED MATERIALS INC·Filed 2014·Granted May 3, 2016·4 cites·20 claims
- 3280US2023313380A1Methods for depositing sacrificial coatings on aerospace componentsAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 3378US12469715B2Dry etching with etch byproduct self-cleaningAPPLIED MATERIALS INC·Filed 2023·Granted Nov 11, 2025·0 cites·12 claims
- 3477US10643840B2Selective deposition defects removal by chemical etchAPPLIED MATERIALS INC·Filed 2018·Granted May 5, 2020·2 cites·20 claims
- 3577US8993058B2Methods and apparatus for forming tantalum silicate layers on germanium or III-V semiconductor devicesAPPLIED MATERIALS INC·Filed 2013·Granted Mar 31, 2015·3 cites·16 claims
- 3676US11894233B2Electronic device having an oxygen free platinum group metal filmAPPLIED MATERIALS INC·Filed 2022·Granted Feb 6, 2024·0 cites·9 claims
- 3776US11697879B2Methods for depositing sacrificial coatings on aerospace componentsAPPLIED MATERIALS INC·Filed 2019·Granted Jul 11, 2023·0 cites·20 claims
- 3876US11643721B2Low temperature deposition of iridium containing filmsAPPLIED MATERIALS INC·Filed 2018·Granted May 9, 2023·0 cites·10 claims
- 3971US10752649B2Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of useAPPLIED MATERIALS INC·Filed 2018·Granted Aug 25, 2020·0 cites·8 claims
- 4071US10221481B2Metal complexes containing amidoimine ligandsSAFC HITECH INC·Filed 2014·Granted Mar 5, 2019·3 cites·25 claims
- 4169US10315995B2Nitrogen-containing ligands and their use in atomic layer deposition methodsAPPLIED MATERIALS INC·Filed 2017·Granted Jun 11, 2019·0 cites·5 claims
- 4267US11332488B2Metal precursors with modified diazabutadiene ligands for CVD and ALD and methods of useAPPLIED MATERIALS INC·Filed 2020·Granted May 17, 2022·0 cites·18 claims
- 4367US9611552B2System and method for controllable non-volatile metal removalVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2015·Granted Apr 4, 2017·1 cites·6 claims
- 4466US12315733B2Enhanced etch selectivity using halidesAPPLIED MATERIALS INC·Filed 2024·Granted May 27, 2025·0 cites·20 claims
- 4564US11396698B2ALD process for NiO film with tunable carbon contentAPPLIED MATERIALS INC·Filed 2018·Granted Jul 26, 2022·0 cites·18 claims
- 4663US10233547B2Methods of etching films with reduced surface roughnessAPPLIED MATERIALS INC·Filed 2018·Granted Mar 19, 2019·0 cites·19 claims
- 4762US9127031B2Bisamineazaallylic ligands and their use in atomic layer deposition methodsTHOMPSON DAVID·Filed 2013·Granted Sep 8, 2015·0 cites·6 claims
- 4862US8927438B2Methods for manufacturing high dielectric constant filmsKIM HYUNGJUN·Filed 2012·Granted Jan 6, 2015·1 cites·11 claims
- 4961US11094544B2Methods of forming self-aligned viasAPPLIED MATERIALS INC·Filed 2019·Granted Aug 17, 2021·0 cites·4 claims
- 5060US11821070B2Ruthenium film deposition using low valent metal precursorsAPPLIED MATERIALS INC·Filed 2020·Granted Nov 21, 2023·0 cites·16 claims
Showing the top 50 of 99 patent records by PatentIndex Score.
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