Inventor · disambiguated record
Arun Vishwanathan
Also filed as: VISHWANATHAN ARUN
12 granted patents·1 pending application·644 citations·filing 1997–2014
93Inventor score
Top patents by PatentIndex Score
13 records- 0197US6749485B1Hydrolytically stable grooved polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted Jun 15, 2004·98 cites·31 claims
- 0297US6736709B1Grooved polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted May 18, 2004·96 cites·28 claims
- 0397US6582283B2Polishing pads for chemical mechanical planarizationRODEL INC·Filed 2002·Granted Jun 24, 2003·71 cites·10 claims
- 0497US6454634B1Polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted Sep 24, 2002·123 cites·48 claims
- 0595US6860802B1Polishing pads for chemical mechanical planarizationROHM AND HAAS ELECTRIC MATERIA·Filed 2000·Granted Mar 1, 2005·81 cites·22 claims
- 0689US5882702AProcess for the formation of plasticized proteinaceous materials and compositions containing the sameWARNER LAMBERT CO·Filed 1997·Granted Mar 16, 1999·79 cites·54 claims
- 0784US6599542B1Non-stick chewing gum baseWARNER LAMBERT CO·Filed 1998·Granted Jul 29, 2003·58 cites·9 claims
- 0881US10574748B2Systems and methods for allocating one or more resources in a composite cloud environmentINFOSYS LTD·Filed 2014·Granted Feb 25, 2020·7 cites·23 claims
- 0976US8727835B2Methods of conditioning a planarizing padMICRON TECHNOLOGY INC·Filed 2013·Granted May 20, 2014·2 cites·19 claims
- 1076US8192257B2Method of manufacture of constant groove depth padsCHANDRASEKARAN NAGA·Filed 2006·Granted Jun 5, 2012·6 cites·19 claims
- 1166US8550878B2Method of manufacture of constant groove depth padsCHANDRASEKARAN NAGA·Filed 2012·Granted Oct 8, 2013·1 cites·21 claims
- 1255US6361409B1Polymeric polishing pad having improved surface layer and method of making sameRODEL INC·Filed 1999·Granted Mar 26, 2002·22 cites·25 claims
- 1341US2005020082A1Polishing pads for chemical mechanical planarizationFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →