Inventor · disambiguated record
Hiromi Sakima
Also filed as: SAKIMA HIROMI
5 granted patents·392 citations·filing 1995–2003
85Inventor score
Technology areasH10P
Top patents by PatentIndex Score
5 records- 0193US6455411B1Defect and etch rate control in trench etch for dual damascene patterning of low-k dielectricsTEXAS INSTRUMENTS INC·Filed 2001·Granted Sep 24, 2002·86 cites·18 claims
- 0293US5556500APlasma etching apparatusTOKYO ELECTRON LTD·Filed 1995·Granted Sep 17, 1996·191 cites·9 claims
- 0387US6159862ASemiconductor processing method and system using C5 F8TOKYO ELECTRON LTD·Filed 1998·Granted Dec 12, 2000·86 cites·12 claims
- 0461US6465359B2Etchant for use in a semiconductor processing method and systemTOKYO ELECTRON LTD·Filed 1999·Granted Oct 15, 2002·22 cites·5 claims
- 0558US7481230B2Plasma processing method and apparatusTOKYO ELECTRON LTD·Filed 2003·Granted Jan 27, 2009·7 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →