Inventor · disambiguated record
Michael Ianiro
Also filed as: IANIRO MICHAEL R
4 granted patents·2 pending applications·47 citations·filing 2003–2006
76Inventor score
Technology areasH10P
Top patents by PatentIndex Score
6 records- 0182US7112123B2Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfacesAMCOL INTERNATIONAL CORP·Filed 2004·Granted Sep 26, 2006·30 cites·14 claims
- 0276US7267784B2Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfacesAMCOL INTERNATIONAL CORP·Filed 2006·Granted Sep 11, 2007·4 cites·13 claims
- 0370US7087529B2Chemical-mechanical polishing (CMP) slurry and method of planarizing surfacesAMCOL INTERNATIONAL CORP·Filed 2003·Granted Aug 8, 2006·11 cites·10 claims
- 0464US7223156B2Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfacesAMCOL INTERNATIONAL CORP·Filed 2005·Granted May 29, 2007·2 cites·25 claims
- 0546US2007011952A1Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfacesAMCOL INTERNAT·Filed 2006·Application pending·0 cites
- 0640US2005072054A1Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfacesAMCOL INTERNAT CORP A DELAWARE·Filed 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →