Inventor · disambiguated record
Murray D. Sirkis
Also filed as: SIRKIS MURRAY · SIRKIS MURRAY D
12 granted patents·4 pending applications·526 citations·filing 1986–2004
93Inventor score
Top patents by PatentIndex Score
16 records- 0196US7164236B2Method and apparatus for improved plasma processing uniformityTOKYO ELECTRON LTD·Filed 2004·Granted Jan 16, 2007·66 cites·15 claims
- 0296US5631685AApparatus and method for drying ink deposited by ink jet printingXEROX CORP·Filed 1993·Granted May 20, 1997·197 cites·41 claims
- 0389US6917204B2Addition of power at selected harmonics of plasma processor drive frequencyTOKYO ELECTRON LTD·Filed 2003·Granted Jul 12, 2005·65 cites·17 claims
- 0487US6891124B2Method of wafer band-edge measurement using transmission spectroscopy and a process for controlling the temperature uniformity of a waferTOKYO ELECTRON LTD·Filed 2001·Granted May 10, 2005·45 cites·20 claims
- 0587US6753498B2Automated electrode replacement apparatus for a plasma processing systemTOKYO ELECTRON LTD·Filed 2003·Granted Jun 22, 2004·29 cites·15 claims
- 0687US6741944B1Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasmaTOKYO ELECTRON LTD·Filed 2000·Granted May 25, 2004·28 cites·10 claims
- 0784US6573731B1Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillatorTOKYO ELECTRON LTD·Filed 2000·Granted Jun 3, 2003·22 cites·34 claims
- 0877US6799532B2Stabilized oscillator circuit for plasma density measurementTOKYO ELECTRON LTD·Filed 2003·Granted Oct 5, 2004·11 cites·22 claims
- 0972US6646386B1Stabilized oscillator circuit for plasma density measurementTOKYO ELECTRON LTD·Filed 2000·Granted Nov 11, 2003·22 cites·4 claims
- 1068US6861844B1Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasmaTOKYO ELECTRON LTD·Filed 2000·Granted Mar 1, 2005·22 cites·13 claims
- 1164US4714810AMeans and methods for heating semiconductor ribbons and wafers with microwvaesUNIV ARIZONA·Filed 1986·Granted Dec 22, 1987·19 cites·19 claims
- 1243US6713969B2Method and apparatus for determination and control of plasma stateTOKYO ELECTRON LTD·Filed 2003·Granted Mar 30, 2004·0 cites·45 claims
- 1343US2003137251A1Method and apparatus for improved plasma processing uniformityFiled 2003·Application pending·0 cites
- 1439US2003106644A1Electrode apparatus and method for plasma processingFiled 2003·Application pending·0 cites
- 1538US2002187280A1Method and system for reducing damage to substrates during plasma processing with a resonator sourceTOKYO ELECTRON LTD·Filed 2002·Application pending·0 cites
- 1638US2003106793A1Electrode for plasma processing systemFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →