Inventor · disambiguated record
Sang Koo Kang
Also filed as: KANG SANG KOO
7 granted patents·4 pending applications·27 citations·filing 2016–2024
77Inventor score
Files withSAMSUNG ELECTRONICS CO LTD11
Top patents by PatentIndex Score
11 records- 0195US10128240B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 13, 2018·21 cites·20 claims
- 0290US10177253B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jan 8, 2019·6 cites·20 claims
- 0362US2025331237A1Semiconductor device including a multi-bridge channel field-effect transistorSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0457US11004732B2Method of manufacturing semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 11, 2021·0 cites·10 claims
- 0557US2024194752A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0657US2024204107A1Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 0756US10580891B2Semiconductor device and method for fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Mar 3, 2020·0 cites·14 claims
- 0852US10381265B2Method of manufacturing semiconductor device with interlayer insulating layersSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Aug 13, 2019·0 cites·17 claims
- 0948US12166093B2Semiconductor devices including epitaxial patterns with plurality of fin-shaped patternsSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Dec 10, 2024·0 cites·19 claims
- 1035US10818657B2Semiconductor device and method for controlling gate profile using thin film stress in gate last processSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Oct 27, 2020·0 cites·9 claims
- 1135US2017117192A1Semiconductor device and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →