Inventor · disambiguated record
Jong-Yuh Chang
Also filed as: CHANG JONG-YUH
23 granted patents·4 pending applications·37 citations·filing 2005–2024
93Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD18TAIWAN SEMICONDUCTOR MFG4ONG BIOW-HIEM2LAI CHIEN-HUNG1LIN CHENG-MING1
Top patents by PatentIndex Score
27 records- 0197US12013632B2Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0295US11143952B2Pellicle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 12, 2021·5 cites·20 claims
- 0385US9581894B2Image mask film scheme and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 28, 2017·2 cites·20 claims
- 0485US2024329517A1Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0583US8818072B2Rendered database image-to-inspection image optimization for inspectionONG BIOW-HIEM·Filed 2010·Granted Aug 26, 2014·10 cites·18 claims
- 0680US9122175B2Image mask film scheme and methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 1, 2015·2 cites·20 claims
- 0778US11048158B2Method for extreme ultraviolet lithography mask treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Jun 29, 2021·2 cites·20 claims
- 0878US9063097B2Systems and methods eliminating false defect detectionsONG BIOW-HIEM·Filed 2011·Granted Jun 23, 2015·4 cites·5 claims
- 0977US9017903B2Mask overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 28, 2015·2 cites·20 claims
- 1076US9373551B2Moveable and adjustable gas injectors for an etching chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jun 21, 2016·3 cites·19 claims
- 1176US8999611B2Mask blank for scattering effect reductionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 7, 2015·2 cites·20 claims
- 1269US9377701B2Mask overlay controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 28, 2016·1 cites·20 claims
- 1367US11906897B2Method for extreme ultraviolet lithography mask treatmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Feb 20, 2024·0 cites·20 claims
- 1462US8629407B2Contamination inspectionLAI CHIEN-HUNG·Filed 2011·Granted Jan 14, 2014·1 cites·20 claims
- 1561US10859906B2Extreme ultraviolet alignment marksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Dec 8, 2020·0 cites·20 claims
- 1661US8792078B2Method and pellicle mounting apparatus for reducing pellicle induced distortionLIN CHENG-MING·Filed 2010·Granted Jul 29, 2014·1 cites·20 claims
- 1761US2024161998A1Direct writing system used for electron beam lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 1860US10156783B2Image mask film scheme and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Dec 18, 2018·0 cites·20 claims
- 1959US9057961B2Systems and methods for lithography masksTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Jun 16, 2015·0 cites·20 claims
- 2056US10345695B2Extreme ultraviolet alignment marksTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jul 9, 2019·0 cites·20 claims
- 2156US10012899B2Graphene pellicle for extreme ultraviolet lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jul 3, 2018·0 cites·20 claims
- 2256US8785083B2Systems and methods for lithography masksTU CHIH-CHIANG·Filed 2012·Granted Jul 22, 2014·0 cites·9 claims
- 2351US10157805B2Moveable and adjustable gas injectors for an etching chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 18, 2018·0 cites·20 claims
- 2450US9689805B2Systems and methods eliminating false defect detectionsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 27, 2017·0 cites·20 claims
- 2549US2010119958A1Mask blank, mask formed from the blank, and method of forming a maskTAIWAN SEMICONDUCTOR MFG·Filed 2008·Application pending·0 cites
- 2644US9529255B2Image process method to improve mask inspection performanceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Dec 27, 2016·0 cites·20 claims
- 2732US2007066071A1Novel organic remover for advanced reticle contamination cleaningTAIWAN SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →