Inventor · disambiguated record
Jacob Fredrik Friso Klinkhamer
Also filed as: KLINKHAMER JACOB F F · KLINKHAMER JACOB FREDRIK FRISCO · KLINKHAMER JACOB FREDRIK FRISO
8 granted patents·6 pending applications·18 citations·filing 2003–2021
81Inventor score
Top patents by PatentIndex Score
14 records- 0177US8164740B2Illumination system coherence remover with two sets of stepped mirrorsVISSER HUIBERT·Filed 2008·Granted Apr 24, 2012·4 cites·14 claims
- 0269US7480028B2Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer programASML NETHERLANDS BV·Filed 2005·Granted Jan 20, 2009·3 cites·26 claims
- 0365US7781237B2Alignment marker and lithographic apparatus and device manufacturing method using the sameASML NETHERLANDS BV·Filed 2005·Granted Aug 24, 2010·2 cites·25 claims
- 0462US6955074B2Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured therebyASML NETHERLANDS BV·Filed 2003·Granted Oct 18, 2005·7 cites·27 claims
- 0555US8159651B2Illumination system coherence remover with a series of partially reflective surfacesVISSER HUIBERT·Filed 2008·Granted Apr 17, 2012·0 cites·10 claims
- 0654US2024111214A1Novel interface definition for lithographic apparatusASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 0753US12449735B2Sub-field control of a lithographic process and associated apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 21, 2025·0 cites·20 claims
- 0853US11360403B2Bandwidth calculation system and method for determining a desired wavelength bandwidth for a measurement beam in a mark detection systemASML NETHERLANDS BV·Filed 2019·Granted Jun 14, 2022·0 cites·12 claims
- 0953US2007247606A1Illumination systemASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1049US2022413391A1Method and apparatus for determining control data for a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1147US7609362B2Scanning lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Oct 27, 2009·2 cites·21 claims
- 1246US2007127005A1Illumination systemASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1340US2007013889A1Lithographic apparatus, device manufacturing method and device manufactured thereby having an increase in depth of focusASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 1438US2005275841A1Alignment marker and lithographic apparatus and device manufacturing method using the sameASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →