Inventor · disambiguated record
Tatsuhiko Higashiki
Also filed as: HIGASHIKI TATSUHIKO
24 granted patents·12 pending applications·250 citations·filing 1996–2016
95Inventor score
Top patents by PatentIndex Score
36 records- 0192US9922991B2Semiconductor memory device and method for manufacturing sameTOSHIBA MEMORY CORP·Filed 2016·Granted Mar 20, 2018·8 cites·13 claims
- 0291US7546178B2Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2007·Granted Jun 9, 2009·14 cites·18 claims
- 0390US8122385B2Mask pattern correcting methodFUKUHARA KAZUYA·Filed 2008·Granted Feb 21, 2012·13 cites·24 claims
- 0487US6437858B1Aberration measuring method, aberration measuring system and aberration measuring maskTOSHIBA KK·Filed 2000·Granted Aug 20, 2002·33 cites·12 claims
- 0586US6262792B1Optical exposure apparatus of scanning exposure system and its exposing methodTOSHIBA KK·Filed 1996·Granted Jul 17, 2001·54 cites·39 claims
- 0677US6813001B2Exposure method and apparatusTOSHIBA KK·Filed 2002·Granted Nov 2, 2004·20 cites·19 claims
- 0773US7952071B2Apparatus and method for inspecting sample surfaceEBARA CORP·Filed 2007·Granted May 31, 2011·3 cites·4 claims
- 0868US6842230B2Exposing methodTOSHIBA KK·Filed 2002·Granted Jan 11, 2005·13 cites·14 claims
- 0968US6730447B2Manufacturing system in electronic devicesTOSHIBA KK·Filed 2002·Granted May 4, 2004·20 cites·29 claims
- 1066US9894271B2Pattern inspection apparatus and pattern inspection methodTOSHIBA MEMORY CORP·Filed 2015·Granted Feb 13, 2018·1 cites·19 claims
- 1165US7985958B2Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing programTOSHIBA KK·Filed 2005·Granted Jul 26, 2011·1 cites·5 claims
- 1264US6479201B2Optical exposure apparatus of scanning exposure system and its exposing methodTOSHIBA KK·Filed 2001·Granted Nov 12, 2002·6 cites·26 claims
- 1361US7018932B2Method for manufacturing a semiconductor device and apparatus for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Mar 28, 2006·7 cites·16 claims
- 1461US6288556B1Method of electrical measurement of misregistration of patternsTOSHIBA KK·Filed 1998·Granted Sep 11, 2001·26 cites·6 claims
- 1557US7269470B2Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Sep 11, 2007·4 cites·18 claims
- 1656US7046334B2Displacement correction apparatus, exposure system, exposure method and a computer program productTOSHIBA KK·Filed 2004·Granted May 16, 2006·4 cites·9 claims
- 1753US8174669B2Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor deviceHIGASHIKI TATSUHIKO·Filed 2009·Granted May 8, 2012·0 cites·12 claims
- 1852US7968272B2Semiconductor device manufacturing method to form resist patternTOSHIBA KK·Filed 2006·Granted Jun 28, 2011·0 cites·4 claims
- 1951US7139998B2Photomask designing method, pattern predicting method and computer program productTOSHIBA KK·Filed 2003·Granted Nov 21, 2006·2 cites·20 claims
- 2051US6008880AExposure tool and method capable of correcting high (N-TH) order light exposure errors depending upon an interfield coordinateTOSHIBA KK·Filed 1997·Granted Dec 28, 1999·18 cites·47 claims
- 2150US2009305165A1Wafer exposing method, euv exposing apparatus, and eb exposing apparatusINANAMI RYOICHI·Filed 2009·Application pending·0 cites
- 2250US2011229826A1Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatusKAWAMURA DAISUKE·Filed 2011·Application pending·0 cites
- 2349US7100146B2Design system of alignment marks for semiconductor manufactureTOSHIBA KK·Filed 2003·Granted Aug 29, 2006·2 cites·20 claims
- 2447US2009148782A1Exposure method, photo mask, and reticle stageKONO TAKUYA·Filed 2008·Application pending·0 cites
- 2547US2014232032A1Lithography original checking device, lithography original checking method, and pattern data creating methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 2646US7630052B2Exposure processing system, exposure processing method and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2004·Granted Dec 8, 2009·1 cites·15 claims
- 2746US2007039637A1Liquid immersion optical tool, method for cleaning liquid immersion optical tool, liquid immersion exposure method and method for manufacturing semiconductor deviceHIGASHIKI TATSUHIKO·Filed 2006·Application pending·0 cites
- 2845US2009004581A1Exposure apparatus, exposure method and optical proximity correction methodFUKUHARA KAZUYA·Filed 2007·Application pending·0 cites
- 2945US2008204685A1Exposure apparatus, exposure method and lithography systemKONO TAKUYA·Filed 2008·Application pending·0 cites
- 3043US2007096764A1Immersion exposure apparatus and method of manufacturing semiconductor deviceKONO TAKUYA·Filed 2006·Application pending·0 cites
- 3142US2004168632A1Manufacturing system in electronic devicesTOSHIBA KK·Filed 2004·Application pending·0 cites
- 3241US8609014B2Template manufacturing method, semiconductor device manufacturing method and templateAZUMA TSUKASA·Filed 2011·Granted Dec 17, 2013·0 cites·9 claims
- 3341US2006001846A1Exposure system and method for manufacturing semiconductor deviceKONO TAKUYA·Filed 2005·Application pending·0 cites
- 3440US2006050351A1Liquid immersion optical tool, method for cleaning liquid immersion optical tool, and method for manufacturing semiconductor deviceHIGASHIKI TATSUHIKO·Filed 2005·Application pending·0 cites
- 3539US2009141378A1Optical element and optical apparatusTAWARAYAMA KAZUO·Filed 2008·Application pending·0 cites
- 3636US6872508B2Exposure method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Mar 29, 2005·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →