Inventor · disambiguated record
Goh Matsuura
Also filed as: MATSUURA GOH
3 granted patents·1 pending application·11 citations·filing 2011–2015
64Inventor score
Technology areasH10P
Top patents by PatentIndex Score
4 records- 0182US8652969B2High aspect ratio and reduced undercut trench etch process for a semiconductor substrateFULLER NICHOLAS C M·Filed 2011·Granted Feb 18, 2014·6 cites·25 claims
- 0273US9711365B2Etch rate enhancement for a silicon etch process through etch chamber pretreatmentIBM·Filed 2014·Granted Jul 18, 2017·3 cites·19 claims
- 0370US8928124B2High aspect ratio and reduced undercut trench etch process for a semiconductor substrateIBM·Filed 2013·Granted Jan 6, 2015·2 cites·14 claims
- 0428US2017243756A1Plasma etching methodZEON CORP·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →