Inventor · disambiguated record
Jeroen Cottaar
Also filed as: COTTAAR JEROEN
9 granted patents·3 pending applications·1 citations·filing 2016–2024
74Inventor score
Top patents by PatentIndex Score
12 records- 0176US2024264081A1Metrology method for measuring an exposed pattern and associated metrology apparatusASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0269US12031909B2Metrology method for measuring an exposed pattern and associated metrology apparatusASML NETHERLANDS BV·Filed 2021·Granted Jul 9, 2024·0 cites·15 claims
- 0367US11137695B2Method of determining a height profile, a measurement system and a computer readable mediumASML NETHERLANDS BV·Filed 2017·Granted Oct 5, 2021·1 cites·14 claims
- 0458US11809088B2Method for controlling a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Nov 7, 2023·0 cites·20 claims
- 0558US2025189897A1Method for determining a spatial distribution of a parameter of interest over at least one substrate or portion thereofASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0655US11982946B2Metrology targetsASML NETHERLANDS BV·Filed 2020·Granted May 14, 2024·0 cites·20 claims
- 0751US12416870B2Measuring method and measuring apparatusASML NETHERLANDS BV·Filed 2020·Granted Sep 16, 2025·0 cites·15 claims
- 0849US11366396B2Method and apparatus for configuring spatial dimensions of a beam during a scanASML NETHERLANDS BV·Filed 2019·Granted Jun 21, 2022·0 cites·20 claims
- 0948US2023040124A1Method for correcting measurements in the manufacture of integrated circuits and associated apparatusesASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1047US10845719B2Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Nov 24, 2020·0 cites·20 claims
- 1138US11636247B2Three-dimensional master equation simulations of charge-carrier transport and recombination in organic semiconductor materials and devicesSIMBEYOND HOLDING B V·Filed 2019·Granted Apr 25, 2023·0 cites·18 claims
- 1235US10915033B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Feb 9, 2021·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →