Inventor · disambiguated record
Kenetsu Mizusawa
Also filed as: MIZUSAWA KENETSU
7 granted patents·5 pending applications·48 citations·filing 2004–2013
84Inventor score
Top patents by PatentIndex Score
12 records- 0194US9441791B2Gas supply unit, substrate processing apparatus and supply gas setting methodTOKYO ELECTRON LTD·Filed 2012·Granted Sep 13, 2016·21 cites·12 claims
- 0287US8236380B2Gas supply system, substrate processing apparatus and gas supply methodMIZUSAWA KENETSU·Filed 2009·Granted Aug 7, 2012·9 cites·8 claims
- 0384US8561572B2Gas supply system, substrate processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2013·Granted Oct 22, 2013·2 cites·10 claims
- 0482US8221638B2Gas supply system, substrate processing apparatus and gas supply methodMIZUSAWA KENETSU·Filed 2009·Granted Jul 17, 2012·4 cites·14 claims
- 0578US8701593B2Gas supply system, substrate processing apparatus and gas supply methodMIZUSAWA KENETSU·Filed 2012·Granted Apr 22, 2014·5 cites·12 claims
- 0677US8906193B2Gas supply unit, substrate processing apparatus and supply gas setting methodMIZUSAWA KENETSU·Filed 2009·Granted Dec 9, 2014·5 cites·4 claims
- 0774US8375893B2Gas supply system, substrate processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2012·Granted Feb 19, 2013·2 cites·14 claims
- 0861US2007151668A1Gas supply system, substrate processing apparatus, and gas supply methodTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 0960US2007175391A1Gas supply system, substrate processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1051US2007181181A1Gas supply system, substrate processing apparatus and gas supply methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1149US2006124169A1Gas supply unit, substrate processing apparatus, and supply gas setting methodTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1237US2005064609A1Semiconductor processing systemTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →