Inventor · disambiguated record
Ernisse Putna
Also filed as: PUTNA ERNISSE · PUTNA ERNISSE S
9 granted patents·6 pending applications·26 citations·filing 2003–2017
83Inventor score
Top patents by PatentIndex Score
15 records- 0172US10459338B2Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and pluggingINTEL CORP·Filed 2017·Granted Oct 29, 2019·1 cites·3 claims
- 0270US7678527B2Methods and compositions for providing photoresist with improved properties for contacting liquidsINTEL CORP·Filed 2003·Granted Mar 16, 2010·11 cites·30 claims
- 0370US7241560B2Basic quencher/developer solutions for photoresistsINTEL CORP·Filed 2005·Granted Jul 10, 2007·3 cites·9 claims
- 0452US9625815B2Exposure activated chemically amplified directed self-assembly (DSA) for back end of line (BEOL) pattern cutting and pluggingNYHUS PAUL A·Filed 2013·Granted Apr 18, 2017·0 cites·3 claims
- 0546US7361455B2Anti-reflective coatingsINTEL CORP·Filed 2004·Granted Apr 22, 2008·1 cites·3 claims
- 0646US2017345643A1Photodefinable alignment layer for chemical assisted patterningINTEL CORP·Filed 2014·Application pending·0 cites
- 0745US7391501B2Immersion liquids with siloxane polymer for immersion lithographyINTEL CORP·Filed 2004·Granted Jun 24, 2008·2 cites·13 claims
- 0843US7507521B2Silicon based optically degraded arc for lithographic patterningINTEL CORP·Filed 2004·Granted Mar 24, 2009·2 cites·15 claims
- 0943US7147985B2Resist compounds including acid labile groups having hydrophilic groups attached theretoINTEL CORP·Filed 2004·Granted Dec 12, 2006·5 cites·18 claims
- 1039US2006090692A1Generating nano-particles for chemical mechanical planarizationDOMINGUEZ JUAN E·Filed 2004·Application pending·0 cites
- 1136US2005158654A1Reducing outgassing of reactive material upon exposure of photolithography resistsFiled 2004·Application pending·0 cites
- 1235US2006147845A1Electrically reconfigurable photolithography mask for semiconductor and micromechanical substratesFLANIGAN KYLE Y·Filed 2005·Application pending·0 cites
- 1335US2005058933A1Quantum efficient photoacid generators for photolithographic processesFiled 2003·Application pending·0 cites
- 1434US2006003271A1Basic supercritical solutions for quenching and developing photoresistsCLARK SHAN C·Filed 2004·Application pending·0 cites
- 1531US7687225B2Optical coatingsINTEL CORP·Filed 2004·Granted Mar 30, 2010·1 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →