Inventor · disambiguated record
Douglas Van Den Broeke
Also filed as: VAN DEN BROEKE DOUGLAS · VAN DEN BROEKE DOUGLAS J · VAN DEN BROEKE DOUGLAS JOSEPH
32 granted patents·4 pending applications·295 citations·filing 2001–2022
97Inventor score
Files withASML MASKTOOLS BV21APPLIED MATERIALS INC5CHEN JANG FUNG3HSU DUAN-FU STEPHEN3ASML MASKTOOKS B V1
Top patents by PatentIndex Score
36 records- 0195US7620930B2Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithographyASML MASKTOOLS BV·Filed 2005·Granted Nov 17, 2009·20 cites·15 claims
- 0292US8132130B2Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure processCHEN JANG FUNG·Filed 2006·Granted Mar 6, 2012·15 cites·19 claims
- 0391US8111921B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2007·Granted Feb 7, 2012·19 cites·16 claims
- 0490US7981576B2Method and apparatus for performing dark field double dipole lithography (DDL)ASML MASKTOOLS BV·Filed 2010·Granted Jul 19, 2011·5 cites·7 claims
- 0590US7824826B2Method and apparatus for performing dark field double dipole lithography (DDL)ASML MASKTOOLS BV·Filed 2007·Granted Nov 2, 2010·9 cites·15 claims
- 0689US8391605B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2012·Granted Mar 5, 2013·9 cites·22 claims
- 0789US7523438B2Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSMASML MASKTOOLS BV·Filed 2005·Granted Apr 21, 2009·15 cites·10 claims
- 0888US8122391B2Method, program product and apparatus for performing double exposure lithographyCHEN JANG FUNG·Filed 2010·Granted Feb 21, 2012·4 cites·32 claims
- 0988US7681171B2Method, program product and apparatus for performing double exposure lithographyASML MASKTOOLS BV·Filed 2006·Granted Mar 16, 2010·14 cites·23 claims
- 1086US7550235B2Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jun 23, 2009·25 cites·12 claims
- 1185US8910091B2Method, program product and apparatus for performing double exposure lithographyCHEN JANG FUNG·Filed 2012·Granted Dec 9, 2014·3 cites·13 claims
- 1284US7617476B2Method for performing pattern pitch-split decomposition utilizing anchoring featuresASML MASKTOOLS BV·Filed 2007·Granted Nov 10, 2009·7 cites·20 claims
- 1383US7892707B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2009·Granted Feb 22, 2011·4 cites·26 claims
- 1483US7398508B2Eigen decomposition based OPC modelASML MASKTOOKS B V·Filed 2004·Granted Jul 8, 2008·27 cites·22 claims
- 1582US7485396B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2008·Granted Feb 3, 2009·4 cites·12 claims
- 1679US8632930B2Method and apparatus for performing dark field double dipole lithography (DDL)HSU DUAN-FU STEPHEN·Filed 2011·Granted Jan 21, 2014·2 cites·14 claims
- 1779US8040573B2Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibrationASML MASKTOOLS BV·Filed 2007·Granted Oct 18, 2011·5 cites·18 claims
- 1879US7354681B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2004·Granted Apr 8, 2008·11 cites·15 claims
- 1978US7514183B2Method for performing transmission tuning of a mask pattern to improve process latitudeASML MASKTOOLS BV·Filed 2004·Granted Apr 7, 2009·16 cites·12 claims
- 2077US6951701B2Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSMASML MASKTOOLS BV·Filed 2002·Granted Oct 4, 2005·18 cites·11 claims
- 2177US6569580B2Binary and phase-shift photomasksDIVERGING TECHNOLOGIES INC·Filed 2001·Granted May 27, 2003·25 cites·28 claims
- 2275US8039180B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2011·Granted Oct 18, 2011·1 cites·24 claims
- 2375US7376930B2Method, program product and apparatus for generating assist features utilizing an image field mapASML MASKTOOLS BV·Filed 2004·Granted May 20, 2008·13 cites·16 claims
- 2474US7614034B2Method and apparatus for generating OPC rules for placement of scattering bar features utilizing interface mapping technologyASML MASKTOOLS BV·Filed 2006·Granted Nov 3, 2009·3 cites·20 claims
- 2569US7604909B2Method for improved manufacturability and patterning of sub-wavelength contact hole maskASML MASKTOOLS BV·Filed 2006·Granted Oct 20, 2009·2 cites·25 claims
- 2668US7026081B2Optical proximity correction method utilizing phase-edges as sub-resolution assist featuresASML MASKTOOLS BV·Filed 2002·Granted Apr 11, 2006·10 cites·18 claims
- 2766US8495529B2Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithographyVAN DEN BROEKE DOUGLAS·Filed 2009·Granted Jul 23, 2013·2 cites·19 claims
- 2864US12429761B2Mura reduction methodAPPLIED MATERIALS INC·Filed 2022·Granted Sep 30, 2025·0 cites·25 claims
- 2964US7892703B2CPL mask and a method and program product for generating the sameASML MASKTOOLS BV·Filed 2006·Granted Feb 22, 2011·1 cites·20 claims
- 3059US6920628B2Method and apparatus for defining mask patterns utilizing a spatial frequency doubling techniqueASML MASKTOOLS BV·Filed 2003·Granted Jul 19, 2005·6 cites·18 claims
- 3159US2015095858A1Method, program product and apparatus for performing double exposure lithographyASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 3256US2024280911A1Digital lithography exposure unit boundary smoothingAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3350US12248254B2Universal metrology file, protocol, and process for maskless lithography systemsAPPLIED MATERIALS INC·Filed 2019·Granted Mar 11, 2025·0 cites·15 claims
- 3448US2023314953A1Methods to improve process window and resolution for digital lithography with auxiliary featuresAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 3547US7998355B2CPL mask and a method and program product for generating the sameASML MASKTOOLS BV·Filed 2007·Granted Aug 16, 2011·0 cites·16 claims
- 3639US2018024448A1Focus centering method for digital lithographyAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →