Inventor · disambiguated record
Seiichiro Kanno
Also filed as: KANNO SEIICHIRO
43 granted patents·22 pending applications·766 citations·filing 1996–2024
98Inventor score
Top patents by PatentIndex Score
65 records- 0195US6646233B2Wafer stage for wafer processing apparatus and wafer processing methodHITACHI HIGH TECH CORP·Filed 2002·Granted Nov 11, 2003·89 cites·2 claims
- 0294US6590179B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Jul 8, 2003·66 cites·29 claims
- 0394US6373681B2Electrostatic chuck, and method of and apparatus for processing sample using the chuckHITACHI LTD·Filed 2001·Granted Apr 16, 2002·67 cites·2 claims
- 0493US7138606B2Wafer processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Nov 21, 2006·53 cites·12 claims
- 0592US10872742B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2016·Granted Dec 22, 2020·8 cites·15 claims
- 0690US6895179B2Wafer stage for wafer processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted May 17, 2005·37 cites·5 claims
- 0790US5946184AElectrostatic chuck, and method of and apparatus for processing sampleHITACHI LTD·Filed 1997·Granted Aug 31, 1999·87 cites·6 claims
- 0889US7396771B2Plasma etching apparatus and plasma etching methodHITACHI HIGH TECH CORP·Filed 2006·Granted Jul 8, 2008·15 cites·4 claims
- 0989US6825617B2Semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Nov 30, 2004·37 cites·11 claims
- 1089US6677167B2Wafer processing apparatus and a wafer stage and a wafer processing methodHITACHI HIGH TECH CORP·Filed 2002·Granted Jan 13, 2004·39 cites·24 claims
- 1185US12211665B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2024·Granted Jan 28, 2025·0 cites·3 claims
- 1285US7931776B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Apr 26, 2011·8 cites·7 claims
- 1384US9401297B2Electrostatic chuck mechanism and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jul 26, 2016·5 cites·10 claims
- 1484US8232522B2Semiconductor inspecting apparatusMIYA GO·Filed 2009·Granted Jul 31, 2012·8 cites·14 claims
- 1584US7771564B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Aug 10, 2010·10 cites·6 claims
- 1683US6716301B2Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probeHITACHI LTD·Filed 2001·Granted Apr 6, 2004·25 cites·23 claims
- 1782US6243251B1Electrostatic chuck, and method of and apparatus for processing sample using the chuckHITACHI LTD·Filed 1999·Granted Jun 5, 2001·50 cites·2 claims
- 1880US10790111B2Charged-particle beam deviceHITACHI HIGH TECH CORP·Filed 2017·Granted Sep 29, 2020·2 cites·11 claims
- 1980US8519332B2Semiconductor inspecting apparatusMIYA GO·Filed 2012·Granted Aug 27, 2013·4 cites·15 claims
- 2079US9601307B2Charged particle radiation apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Mar 21, 2017·4 cites·5 claims
- 2179US7567422B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2005·Granted Jul 28, 2009·6 cites·7 claims
- 2279US6549393B2Semiconductor wafer processing apparatus and methodHITACHI LTD·Filed 2001·Granted Apr 15, 2003·19 cites·8 claims
- 2377US11929231B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2022·Granted Mar 12, 2024·0 cites·4 claims
- 2476US6771481B2Plasma processing apparatus for processing semiconductor wafer using plasmaHITACHI LTD·Filed 2001·Granted Aug 3, 2004·19 cites·21 claims
- 2575US8680466B2Electron microscope, and specimen holding methodKANNO SEIICHIRO·Filed 2009·Granted Mar 25, 2014·5 cites·10 claims
- 2674US11735394B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Aug 22, 2023·1 cites·11 claims
- 2773US12106930B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2019·Granted Oct 1, 2024·1 cites·15 claims
- 2873US8282767B2Plasma processing apparatusITABASHI NAOSHI·Filed 2011·Granted Oct 9, 2012·3 cites·2 claims
- 2973US7838792B2Plasma processing apparatus capable of adjusting temperature of sample standHITACHI HIGH TECH CORP·Filed 2006·Granted Nov 23, 2010·4 cites·3 claims
- 3073US6370007B2Electrostatic chuckHITACHI LTD·Filed 2001·Granted Apr 9, 2002·17 cites·3 claims
- 3172US9543113B2Charged-particle beam device for irradiating a charged particle beam on a sampleHITACHI HIGH TECH CORP·Filed 2014·Granted Jan 10, 2017·2 cites·6 claims
- 3272US5781400AElectrostatically attracting electrode and a method of manufacture thereofHITACHI LTD·Filed 1996·Granted Jul 14, 1998·34 cites·9 claims
- 3370US10903036B2Charged-particle beam deviceHITACHI HIGH TECH CORP·Filed 2020·Granted Jan 26, 2021·0 cites·13 claims
- 3470US9105446B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted Aug 11, 2015·2 cites·5 claims
- 3568US8653455B2Charged particle beam device and evaluation method using the charged particle beam deviceKITSUNAI HIROYUKI·Filed 2010·Granted Feb 18, 2014·3 cites·11 claims
- 3666US6747239B2Plasma processing apparatus and methodHITACHI LTD·Filed 2003·Granted Jun 8, 2004·8 cites·15 claims
- 3764US11335533B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2017·Granted May 17, 2022·0 cites·10 claims
- 3864US9666408B2Apparatus and method for processing sample, and charged particle radiation apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted May 30, 2017·1 cites·14 claims
- 3963US6583979B1Electrostatically attracting electrode and a method of manufacture thereofHITACHI LTD·Filed 1998·Granted Jun 24, 2003·25 cites·6 claims
- 4054US8921781B2Measurement or inspecting apparatusHITACHI HIGH TECHNOLOGIES·Filed 2013·Granted Dec 30, 2014·0 cites·8 claims
- 4153US2009152241A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2009·Application pending·0 cites
- 4252US2025170623A1Vacuum Processing Device and Foreign Matter Ejection MethodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 4351US7183715B2Method for operating a semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Feb 27, 2007·2 cites·18 claims
- 4451US2008017107A1Plasma processing apparatusARAI MASATSUGU·Filed 2007·Application pending·0 cites
- 4549US2010033695A1Lithography apparatus and manufacturing method using the sameHITACHI LTD·Filed 2009·Application pending·0 cites
- 4649US2010282414A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 4749US2008110569A1Plasma etching apparatus and plasma etching methodMIYA GO·Filed 2007·Application pending·0 cites
- 4848US2006043064A1Plasma processing system and methodTANAKA JUNICHI·Filed 2004·Application pending·0 cites
- 4948US2007240825A1Wafer processing apparatus capable of controlling wafer temperatureKANNO SEIICHIRO·Filed 2007·Application pending·0 cites
- 5045US2009178764A1Plasma processing apparatus including electrostatic chuck with built-in heaterHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
Showing the top 50 of 65 patent records by PatentIndex Score.
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