Inventor · disambiguated record
Takashi Yamanobe
Also filed as: YAMANOBE TAKASHI
20 granted patents·2 pending applications·540 citations·filing 1984–2004
96Inventor score
Files withTOSHIBA KK14AGENCY IND SCIENCE TECHN4MEIJI SEIKA KAISHA1NAT INST OF ADVANCED IND SCIEN1OJI YUKA GOSEISHI KK1
Top patents by PatentIndex Score
22 records- 0192US5418071ASputtering target and method of manufacturing the sameTOSHIBA KK·Filed 1993·Granted May 23, 1995·67 cites·21 claims
- 0283US5470527ATi-W sputtering target and method for manufacturing sameTOSHIBA KK·Filed 1994·Granted Nov 28, 1995·53 cites·14 claims
- 0382US4842706ASputtering targetTOSHIBA KK·Filed 1988·Granted Jun 27, 1989·41 cites·3 claims
- 0481US5294321ASputtering targetTOSHIBA KK·Filed 1992·Granted Mar 15, 1994·28 cites·10 claims
- 0580US5332542AProcess for producing labeled hollow containerOJI YUKA GOSEISHI KK·Filed 1992·Granted Jul 26, 1994·43 cites·5 claims
- 0680US5196916AHighly purified metal material and sputtering target using the sameTOSHIBA KK·Filed 1991·Granted Mar 23, 1993·54 cites·36 claims
- 0778US5733427ASputtering target and method of manufacturing the sameTOSHIBA KK·Filed 1995·Granted Mar 31, 1998·29 cites·7 claims
- 0877US6165607ASputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the sameTOSHIBA KK·Filed 1997·Granted Dec 26, 2000·44 cites·56 claims
- 0974US5447616ASputtering targetTOSHIBA KK·Filed 1993·Granted Sep 5, 1995·20 cites·7 claims
- 1073US6127160AProtein having cellulase activities and process for producing the sameAGENCY IND SCIENCE TECHN·Filed 1997·Granted Oct 3, 2000·30 cites·10 claims
- 1169US4562150AMethod for manufacture of cellulaseAGENCY IND SCIENCE TECHN·Filed 1984·Granted Dec 31, 1985·14 cites·3 claims
- 1266US6352628B2Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor deviceTOSHIBA KK·Filed 2001·Granted Mar 5, 2002·8 cites·5 claims
- 1365US5458697AHighly purified metal material and sputtering target using the sameTOSHIBA KK·Filed 1994·Granted Oct 17, 1995·28 cites·23 claims
- 1463US5679983AHighly purified metal material and sputtering target using the sameTOSHIBA KK·Filed 1995·Granted Oct 21, 1997·22 cites·3 claims
- 1561US4956291AMethod for production of cellulolytic enzymes and method for saccharification of cellulosic materials therewithAGENCY IND SCIENCE TECHN·Filed 1987·Granted Sep 11, 1990·22 cites·1 claims
- 1657US6309593B1Refractory metal silicide target, method of manufacturing the target, refractory metal silicide thin film, and semiconductor deviceTOSHIBA KK·Filed 1994·Granted Oct 30, 2001·15 cites·5 claims
- 1756US7988786B2Carbon film coated memberTOSHIBA KK·Filed 2004·Granted Aug 2, 2011·4 cites·7 claims
- 1855US4742005AMethod for production of cellulolytic enzymes and method for saccharification of cellulosic materials therewithAGENCY IND SCIENCE TECHN·Filed 1985·Granted May 3, 1988·17 cites·3 claims
- 1942US2003106655A1Process for treating with enzymeFiled 2001·Application pending·0 cites
- 2041US2003087096A1Carbon film coated memberTOSHIBA KK·Filed 2002·Application pending·0 cites
- 2138US7256031B2Enzyme having β-glucosidase activity and use thereofNAT INST OF ADVANCED IND SCIEN·Filed 2001·Granted Aug 14, 2007·0 cites·65 claims
- 2225US6140097AMesophilic xylanasesMEIJI SEIKA KAISHA·Filed 1998·Granted Oct 31, 2000·1 cites·3 claims
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