Inventor · disambiguated record
Paul B. Mirkarimi
Also filed as: MIRKARIMI PAUL B
12 granted patents·3 pending applications·348 citations·filing 1998–2018
92Inventor score
Top patents by PatentIndex Score
15 records- 0192US6821682B1Repair of localized defects in multilayer-coated reticle blanks for extreme ultraviolet lithographyEUV LLC·Filed 2000·Granted Nov 23, 2004·61 cites·21 claims
- 0289US6011646AMethod to adjust multilayer film stress induced deformation of opticsUNVIERSITY OF CALIFORNIA·Filed 1998·Granted Jan 4, 2000·103 cites·27 claims
- 0385US6134049AMethod to adjust multilayer film stress induced deformation of opticsUNIV CALIFORNIA·Filed 1998·Granted Oct 17, 2000·71 cites·23 claims
- 0482US6967168B2Method to repair localized amplitude defects in a EUV lithography mask blankEUV LLC·Filed 2001·Granted Nov 22, 2005·27 cites·26 claims
- 0577US6309705B1Process for fabricating high reflectance-low stress Mo—Si multilayer reflective coatingsUNIV CALIFORNIA·Filed 2000·Granted Oct 30, 2001·14 cites·14 claims
- 0671US7049033B2EUV lithography reticles fabricated without the use of a patterned absorberEUV LLC·Filed 2003·Granted May 23, 2006·9 cites·14 claims
- 0770US6635391B2Method for fabricating reticles for EUV lithography without the use of a patterned absorberUNIV CALIFORNIA·Filed 2000·Granted Oct 21, 2003·9 cites·15 claims
- 0870US6110607AHigh reflectance-low stress Mo-Si multilayer reflective coatingsUNIV CALIFORNIA·Filed 1998·Granted Aug 29, 2000·24 cites·15 claims
- 0965US10901121B2Planarization of optical substratesL LIVERMORE NAT SECURITY LLC·Filed 2018·Granted Jan 26, 2021·0 cites·18 claims
- 1060US6319635B1Mitigation of substrate defects in reticles using multilayer buffer layersUNIV CALIFORNIA·Filed 1999·Granted Nov 20, 2001·26 cites·26 claims
- 1153US7022435B2Method for the manufacture of phase shifting masks for EUV lithographyEUV LLC·Filed 2002·Granted Apr 4, 2006·4 cites·16 claims
- 1247US10175391B2Planarization of optical substratesL LIVERMORE NAT SECURITY LLC·Filed 2013·Granted Jan 8, 2019·0 cites·12 claims
- 1343US2005118533A1Planarization of substrate pits and scratchesFiled 2004·Application pending·0 cites
- 1438US2003164998A1Ion-assisted deposition techniques for the planarization of topological defectsUNIV CALIFORNIA·Filed 2002·Application pending·0 cites
- 1538US2006234135A1Method for repairing mask-blank defects using repair-zone compensationUNIV CA·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →