Inventor · disambiguated record
Gunilla Jacobson
Also filed as: JACOBSON GUNILLA · JACOBSON GUNILLA B
5 granted patents·10 pending applications·969 citations·filing 1992–2023
81Inventor score
Files withTOKYO ELECTRON LTD5JACOBSON GUNILLA4UNIV LELAND STANFORD JUNIOR2INTEL CORP1JACOBSON GUNILLA B1
Top patents by PatentIndex Score
15 records- 0196US5376252AMicrofluidic structure and process for its manufacturePHARMACIA BIOSENSOR AB·Filed 1992·Granted Dec 27, 1994·948 cites·30 claims
- 0269US7387868B2Treatment of a dielectric layer using supercritical CO2TOKYO ELECTRON LTD·Filed 2005·Granted Jun 17, 2008·3 cites·36 claims
- 0367US7250374B2System and method for processing a substrate using supercritical carbon dioxide processingTOKYO ELECTRON LTD·Filed 2004·Granted Jul 31, 2007·11 cites·24 claims
- 0459US6479708B1Biphasic catalysis in water/carbon dioxide micellar systemsUNIV CALIFORNIA·Filed 1999·Granted Nov 12, 2002·7 cites·28 claims
- 0556US2025186754A1Compliant Polymeric Structures Having Polymeric Microneedles and Methods for Making and Using SameUNIV LELAND STANFORD JUNIOR·Filed 2023·Application pending·0 cites
- 0644US2008095856A1Encapsulated Nanoparticles for Drug DeliveryJACOBSON GUNILLA B·Filed 2007·Application pending·0 cites
- 0742US10322089B2Nanoparticles, nanoparticle delivery methods, and systems of deliveryUNIV LELAND STANFORD JUNIOR·Filed 2013·Granted Jun 18, 2019·0 cites·6 claims
- 0838US2006102208A1System for removing a residue from a substrate using supercritical carbon dioxide processingTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 0936US2006102204A1Method for removing a residue from a substrate using supercritical carbon dioxide processingINTEL CORP·Filed 2004·Application pending·0 cites
- 1036US2006219268A1Neutralization of systemic poisoning in wafer processingJACOBSON GUNILLA·Filed 2005·Application pending·0 cites
- 1134US2006102591A1Method and system for treating a substrate using a supercritical fluidTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1234US2006180572A1Removal of post etch residue for a substrate with open metal surfacesTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 1332US2006186088A1Etching and cleaning BPSG material using supercritical processingJACOBSON GUNILLA·Filed 2005·Application pending·0 cites
- 1431US2007000519A1Removal of residues for low-k dielectric materials in wafer processingJACOBSON GUNILLA·Filed 2005·Application pending·0 cites
- 1531US2006255012A1Removal of particles from substrate surfaces using supercritical processingJACOBSON GUNILLA·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →