Inventor · disambiguated record
Michael Pokoj
Also filed as: POKOJ MICHAEL
2 granted patents·1 pending application·12 citations·filing 2006–2007
55Inventor score
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3 records- 0180US7754908B2Tungsten and molybdenum compounds and their use for chemical vapour deposition (CVD)STRACK H C CLEVIOS GMBH·Filed 2007·Granted Jul 13, 2010·10 cites·8 claims
- 0254US7442407B2Tantalum and niobium compounds and their use for chemical vapour deposition (CVD)STARCK H C GMBH·Filed 2006·Granted Oct 28, 2008·2 cites·13 claims
- 0339US2008038466A1Tantalum and niobium compounds and their use for chemical vapour deposition (cvd)STARCK H C GMBH·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →