Inventor · disambiguated record
Richard A. Ferguson
Also filed as: FERGUSON RICHARD A · FERGUSON RICHARD ALAN
13 granted patents·1,239 citations·filing 1994–2005
95Inventor score
Files withIBM13
Top patents by PatentIndex Score
13 records- 0199US6578190B2Process window based optical proximity correction of lithographic imagesIBM·Filed 2001·Granted Jun 10, 2003·289 cites·24 claims
- 0297US7147976B2Binary OPC for assist feature layout optimizationIBM·Filed 2005·Granted Dec 12, 2006·40 cites·6 claims
- 0397US5965306AMethod of determining the printability of photomask defectsIBM·Filed 1997·Granted Oct 12, 1999·194 cites·52 claims
- 0496US7001693B2Binary OPC for assist feature layout optimizationIBM·Filed 2003·Granted Feb 21, 2006·70 cites·13 claims
- 0594US6223139B1Kernel-based fast aerial image computation for a large scale design of integrated circuit patternsIBM·Filed 1998·Granted Apr 24, 2001·124 cites·8 claims
- 0694US5807649ALithographic patterning method and mask set therefor with light field trim maskIBM·Filed 1996·Granted Sep 15, 1998·187 cites·20 claims
- 0790US5932377AExact transmission balanced alternating phase-shifting mask for photolithographyIBM·Filed 1998·Granted Aug 3, 1999·86 cites·22 claims
- 0889US6184151B1Method for forming cornered images on a substrate and photomask formed therebyIBM·Filed 1999·Granted Feb 6, 2001·92 cites·17 claims
- 0977US6327033B1Detection of phase defects on photomasks by differential imagingIBM·Filed 1999·Granted Dec 4, 2001·37 cites·24 claims
- 1077US5936738AFocus monitor for alternating phase shifted masksIBM·Filed 1998·Granted Aug 10, 1999·40 cites·36 claims
- 1176US5959325AMethod for forming cornered images on a substrate and photomask formed therebyIBM·Filed 1997·Granted Sep 28, 1999·43 cites·7 claims
- 1261US6596442B1Asymmetric halftone biasing for sub-grid pattern adjustmentIBM·Filed 2000·Granted Jul 22, 2003·6 cites·17 claims
- 1361US5538833AHigh resolution phase edge lithography without the need for a trim maskIBM·Filed 1994·Granted Jul 23, 1996·31 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →