Inventor · disambiguated record
Paul Luscher
Also filed as: LUESCHER PAUL · LUSCHER PAUL · LUSCHER PAUL E · LUSCHER PAUL ERNEST
30 granted patents·4 pending applications·1,729 citations·filing 1978–2006
98Inventor score
Top patents by PatentIndex Score
34 records- 0197US5891350AAdjusting DC bias voltage in plasma chambersAPPLIED MATERIALS INC·Filed 1996·Granted Apr 6, 1999·186 cites·21 claims
- 0296US6716302B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Apr 6, 2004·91 cites·18 claims
- 0396US6232236B1Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 1999·Granted May 15, 2001·134 cites·32 claims
- 0495US6481886B1Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing systemAPPLIED MATERIALS INC·Filed 2000·Granted Nov 19, 2002·92 cites·24 claims
- 0594US6797639B2Dielectric etch chamber with expanded process windowAPPLIED MATERIALS INC·Filed 2002·Granted Sep 28, 2004·63 cites·30 claims
- 0693US6432259B1Plasma reactor cooled ceiling with an array of thermally isolated plasma heated mini-gas distribution platesAPPLIED MATERIALS INC·Filed 1999·Granted Aug 13, 2002·104 cites·101 claims
- 0793US6353210B1Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using and in-situ wafer temperature optical probeAPPLIED MATERIALS INC·Filed 2000·Granted Mar 5, 2002·85 cites·20 claims
- 0892US6916399B1Temperature controlled window with a fluid supply systemAPPLIED MATERIALS INC·Filed 1999·Granted Jul 12, 2005·168 cites·20 claims
- 0992US6192827B1Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 1998·Granted Feb 27, 2001·108 cites·16 claims
- 1090US6813534B2Endpoint detection in substrate fabrication processesFiled 2002·Granted Nov 2, 2004·54 cites·30 claims
- 1190US6513452B2Adjusting DC bias voltage in plasma chamberAPPLIED MATERIALS INC·Filed 2001·Granted Feb 4, 2003·29 cites·20 claims
- 1289US5995235ABandpass photon detectorAPPLIED MATERIALS INC·Filed 1997·Granted Nov 30, 1999·96 cites·12 claims
- 1387US5737177AApparatus and method for actively controlling the DC potential of a cathode pedestalAPPLIED MATERIALS INC·Filed 1996·Granted Apr 7, 1998·93 cites·13 claims
- 1486US6589361B2Configurable single substrate wet-dry integrated cluster cleanerAPPLIED MATERIALS INC·Filed 2001·Granted Jul 8, 2003·35 cites·56 claims
- 1584US6575622B2Correction of wafer temperature drift in a plasma reactor based upon continuous wafer temperature measurements using an in-situ wafer temperature optical probeAPPLIED MATERIALS INC·Filed 2001·Granted Jun 10, 2003·31 cites·4 claims
- 1683US4580035AApparatus for heating food-warmer platesLUEKON ELEKTROTHERM APP·Filed 1984·Granted Apr 1, 1986·43 cites·10 claims
- 1783US4382811AMethod of producing protective coatings on metal parts to be used in contact with molten glassCASTOLIN SA·Filed 1981·Granted May 10, 1983·27 cites·6 claims
- 1882US6221782B1Adjusting DC bias voltage in plasma chamberAPPLIED MATERIALS INC·Filed 1999·Granted Apr 24, 2001·31 cites·12 claims
- 1982US6076482AThin film processing plasma reactor chamber with radially upward sloping ceiling for promoting radially outward diffusionAPPLIED MATERIALS INC·Filed 1997·Granted Jun 20, 2000·41 cites·36 claims
- 2079US7147719B2Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 2003·Granted Dec 12, 2006·17 cites·15 claims
- 2178US4392453AMolecular beam converters for vacuum coating systemsVARIAN ASSOCIATES·Filed 1981·Granted Jul 12, 1983·30 cites·32 claims
- 2277US5253266AMBE effusion source with asymmetrical heatersINTEVAC INC·Filed 1992·Granted Oct 12, 1993·50 cites·21 claims
- 2376US6863835B1Magnetic barrier for plasma in chamber exhaustFiled 2000·Granted Mar 8, 2005·10 cites·33 claims
- 2473US6647918B1Double slit-valve doors for plasma processingAPPLIED MATERIALS INC·Filed 2000·Granted Nov 18, 2003·13 cites·43 claims
- 2569US6899111B2Configurable single substrate wet-dry integrated cluster cleanerAPPLIED MATERIALS INC·Filed 2001·Granted May 31, 2005·12 cites·34 claims
- 2667US6535779B1Apparatus and method for endpoint control and plasma monitoringAPPLIED MATERIALS INC·Filed 1998·Granted Mar 18, 2003·41 cites·40 claims
- 2765US4201152ATransfer and temperature monitoring apparatusVARIAN ASSOCIATES·Filed 1978·Granted May 6, 1980·19 cites·19 claims
- 2864US6773544B2Magnetic barrier for plasma in chamber exhaustFiled 2001·Granted Aug 10, 2004·5 cites·17 claims
- 2960US6822185B2Temperature controlled dome-coil system for high power inductively coupled plasma systemsAPPLIED MATERIALS INC·Filed 2002·Granted Nov 23, 2004·7 cites·56 claims
- 3060US2007091535A1Temperature controlled semiconductor processing chamber linerAPPLIED MATERIALS INC·Filed 2006·Application pending·0 cites
- 3157US4508959AApparatus for heating stackable dishesLUEKON ELTHERM APP P LUESCHER·Filed 1983·Granted Apr 2, 1985·14 cites·11 claims
- 3244US2005003675A1Dielectric etch chamber with expanded process windowFiled 2004·Application pending·0 cites
- 3342US2002069970A1Temperature controlled semiconductor processing chamber linerAPPLIED MATERIALS INC·Filed 2002·Application pending·0 cites
- 3440US2001009139A1Apparatus and method for controlling plasma uniformity in a semiconductor wafer processing systemFiled 2001·Application pending·0 cites
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