Inventor · disambiguated record
Sanjay Malik
Also filed as: MALIK SANJAY
39 granted patents·16 pending applications·362 citations·filing 1990–2025
97Inventor score
Files withFUJIFILM ELECTRONIC MAT USA INC31ARCH SPEC CHEM INC14FUJIFILM ELECTRONIC MATERIALS4OLIN MICROELECTRONIC CHEM INC2ARCH CHEM INC1
Top patents by PatentIndex Score
55 records- 0192US10604628B2Polymer and thermosetting composition containing sameFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Mar 31, 2020·2 cites·39 claims
- 0292US10563014B2Dielectric film forming compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2018·Granted Feb 18, 2020·3 cites·37 claims
- 0391US9617386B2Process for the production of polyimide and polyamic ester polymersFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Apr 11, 2017·4 cites·20 claims
- 0490US9695284B2Polymer and thermosetting composition containing sameFUJIFILM ELECTRONIC MAT USA INC·Filed 2014·Granted Jul 4, 2017·3 cites·22 claims
- 0588US6143467APhotosensitive polybenzoxazole precursor compositionsARCH SPEC CHEM INC·Filed 1999·Granted Nov 7, 2000·63 cites·26 claims
- 0687US10036952B2Photosensitive polyimide compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2016·Granted Jul 31, 2018·4 cites·45 claims
- 0786US6610808B2Thermally cured underlayer for lithographic applicationARCH SPEC CHEM INC·Filed 2002·Granted Aug 26, 2003·28 cites·6 claims
- 0885US6916543B2Copolymer, photoresist compositions thereof and deep UV bilayer system thereofARCH SPEC CHEM INC·Filed 2003·Granted Jul 12, 2005·28 cites·68 claims
- 0983US11899364B2Photosensitive polyimide compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Feb 13, 2024·1 cites·22 claims
- 1082US6312870B1t-butyl cinnamate polymers and their use in photoresist compositionsARCH SPEC CHEM INC·Filed 2000·Granted Nov 6, 2001·29 cites·24 claims
- 1181US10875965B2Dielectric film forming compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2018·Granted Dec 29, 2020·2 cites·42 claims
- 1280US5080121AProcess for the preparation of a new polymer useful for drag reduction in hydrocarbon fluids in exceptionally dilute polymer solutionsCOUNCIL SCIENT IND RES·Filed 1990·Granted Jan 14, 1992·46 cites·18 claims
- 1378US10781341B2Polyimide compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2015·Granted Sep 22, 2020·2 cites·33 claims
- 1477US12338309B2Dielectric film-forming compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2024·Granted Jun 24, 2025·0 cites·18 claims
- 1577US6830870B2Acetal protected polymers and photoresists compositions thereofARCH SPECIALITY CHEMICALS INC·Filed 2003·Granted Dec 14, 2004·19 cites·42 claims
- 1674US6133412AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH CHEM INC·Filed 1999·Granted Oct 17, 2000·21 cites·5 claims
- 1774US2025285785A1Dry filmFUJIFILM ELECTRONIC MAT USA INC·Filed 2025·Application pending·0 cites
- 1873US6924339B2Thermally cured underlayer for lithographic applicationARCH SPEC CHEM INC·Filed 2003·Granted Aug 2, 2005·12 cites·18 claims
- 1971US9777117B2Process for the production of polyimide and polyamic ester polymersFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Oct 3, 2017·0 cites·27 claims
- 2071US6783917B2Silicon-containing acetal protected polymers and photoresists compositions thereofARCH SPEC CHEM INC·Filed 2002·Granted Aug 31, 2004·13 cites·41 claims
- 2171US5985507ASelected high thermal novolaks and positive-working radiation-sensitive compositionsOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Nov 16, 1999·23 cites·20 claims
- 2268US11945894B2Dielectric film-forming compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Apr 2, 2024·0 cites·14 claims
- 2367US6159653AProduction of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1998·Granted Dec 12, 2000·24 cites·15 claims
- 2467US2024408590A1Bioderived organic solventsFUJIFILM ELECTRONIC MAT USA INC·Filed 2024·Application pending·0 cites
- 2565US2025188223A1Polyimides comprising novel indane bis-o-aminophenols, photosensitive compositions, dielectric films, and buffer coatings containing the sameFUJIFILM ELECTRONIC MAT USA INC·Filed 2024·Application pending·0 cites
- 2663US11939428B2PolyimidesFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Granted Mar 26, 2024·0 cites·33 claims
- 2762US7727705B2High etch resistant underlayer compositions for multilayer lithographic processesFUJIFILM ELECTRONIC MATERIALS·Filed 2008·Granted Jun 1, 2010·2 cites·18 claims
- 2861US11782344B2Photosensitive polyimide compositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2018·Granted Oct 10, 2023·0 cites·21 claims
- 2960US2024248400A1Dielectric film forming composition containing acyl germanium compoundFUJIFILM ELECTRONIC MAT USA INC·Filed 2023·Application pending·0 cites
- 3060US2025046717A1Microelectronic Devices with Good Reliability and Related Compositions and MethodsFUJIFILM ELECTRONIC MAT USA INC·Filed 2024·Application pending·0 cites
- 3160US2023053355A1Dry FilmFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Application pending·0 cites
- 3256US6803434B2Process for producing anhydride-containing polymers for radiation sensitive compositionsARCH SPEC CHEM INC·Filed 2003·Granted Oct 12, 2004·3 cites·27 claims
- 3356US6309793B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 2000·Granted Oct 30, 2001·9 cites·20 claims
- 3456US2022127459A1Dielectric Film-Forming CompositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Application pending·0 cites
- 3553US11721543B2Planarizing process and compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2020·Granted Aug 8, 2023·0 cites·14 claims
- 3651US6027853AProcess for preparing a radiation-sensitive compositionOLIN MICROELECTRONIC CHEM INC·Filed 1998·Granted Feb 22, 2000·12 cites·21 claims
- 3750US10793676B2PolyimidesFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Oct 6, 2020·0 cites·38 claims
- 3849US10696932B2Cleaning compositionFUJIFILM ELECTRONIC MAT USA INC·Filed 2016·Granted Jun 30, 2020·0 cites·40 claims
- 3949US10345707B2Stripping processFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Jul 9, 2019·0 cites·21 claims
- 4049US7491783B2Process for highly purified polyhedral oligomeric silsesquioxane monomersSCHWAB JOSEPH J·Filed 2005·Granted Feb 17, 2009·0 cites·15 claims
- 4149US7416821B2Thermally cured undercoat for lithographic applicationFUJIFILM ELECTRONIC MATERIALS·Filed 2005·Granted Aug 26, 2008·3 cites·24 claims
- 4249US2020262978A1PolyimidesFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Application pending·0 cites
- 4349US2022017673A1Dielectric Film Forming CompositionsFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Application pending·0 cites
- 4449US2021287939A1Metal Deposition ProcessesFUJIFILM ELECTRONIC MAT USA INC·Filed 2021·Application pending·0 cites
- 4548US11634529B2Multilayer structureFUJIFILM ELECTRONIC MAT USA INC·Filed 2018·Granted Apr 25, 2023·0 cites·16 claims
- 4645US11175582B2Photosensitive stacked structureFUJIFILM ELECTRONIC MAT USA INC·Filed 2016·Granted Nov 16, 2021·0 cites·24 claims
- 4745US2008199805A1Photosensitive compositions employing silicon-containing additivesFUJIFILM ELECTRONIC MATERIALS·Filed 2008·Application pending·0 cites
- 4844US2008199814A1Device manufacturing process utilizing a double patterning processFUJIFILM ELECTRONIC MATERIALS·Filed 2007·Application pending·0 cites
- 4939US6380317B1Production of acetal derivatized hydroxyl aromatic polymers and their use in radiation sensitive formulationsARCH SPEC CHEM INC·Filed 1999·Granted Apr 30, 2002·5 cites·10 claims
- 5038US11061327B2PolyimidesFUJIFILM ELECTRONIC MAT USA INC·Filed 2017·Granted Jul 13, 2021·0 cites·37 claims
Showing the top 50 of 55 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →