Inventor · disambiguated record
Tomo Oikawa
Also filed as: OIKAWA TOMO
10 granted patents·5 pending applications·12 citations·filing 1998–2023
81Inventor score
Top patents by PatentIndex Score
15 records- 0176US7695889B2Copolymer for semiconductor lithography and process for production thereofMARUZEN PETROCHEM CO LTD·Filed 2006·Granted Apr 13, 2010·4 cites·18 claims
- 0275US8455596B2Method for producing a copolymer for photoresistOIKAWA TOMO·Filed 2010·Granted Jun 4, 2013·4 cites·13 claims
- 0368US2025282903A1Copolymer of hydroxystyrene-based monomer and (meth)acrylic acid ester-based monomer, and production method thereofMARUZEN PETROCHEM CO LTD·Filed 2023·Application pending·0 cites
- 0459US8211615B2Copolymer for immersion lithography and compositionsYAMAGISHI TAKANORI·Filed 2007·Granted Jul 3, 2012·1 cites·8 claims
- 0556US7045582B2Preparation process of copolymer for semiconductor lithography and a copolymer for semiconductor lithography available by this processMARUZEN PETROCHEM CO LTD·Filed 2004·Granted May 16, 2006·3 cites·11 claims
- 0656US2023242467A1High purity 4-hydroxystyrene solution, method of producing the same, and method of producing 4-hydroxystyrene polymerMARUZEN PETROCHEM CO LTD·Filed 2021·Application pending·0 cites
- 0755US8163852B2Resist polymer and method for producing the polymerYAMAGISHI TAKANORI·Filed 2009·Granted Apr 24, 2012·0 cites·1 claims
- 0855US2025230287A1Method for producing polymer solutionMARUZEN PETROCHEM CO LTD·Filed 2023·Application pending·0 cites
- 0950US9023982B2Method for purifying resin for photolithographyMARUZEN PETROCHEM CO LTD·Filed 2013·Granted May 5, 2015·0 cites·16 claims
- 1048US2005287474A1Resist polymer and method for producing the polymerYAMAGISHI TAKANORI·Filed 2005·Application pending·0 cites
- 1143US7972762B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jul 5, 2011·0 cites·10 claims
- 1242US8759462B2Method for producing resist copolymer having low molecular weightMARUZEN PETROCHEM CO LTD·Filed 2012·Granted Jun 24, 2014·0 cites·4 claims
- 1342US2004167298A1Resist polymer and method for producing the polymerFiled 2004·Application pending·0 cites
- 1438US8859180B2Copolymer and composition for semiconductor lithography and process for producing the copolymerOIKAWA TOMO·Filed 2007·Granted Oct 14, 2014·0 cites·12 claims
- 1521US5945544AProcess for production of N-vinyllactamMARUZEN PETROCHEM CO LTD·Filed 1998·Granted Aug 31, 1999·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →