Inventor · disambiguated record
Coming Chen
Also filed as: CHEN COMING
40 granted patents·3 pending applications·864 citations·filing 1996–2019
98Inventor score
Files withUNITED MICROELECTRONICS CORP38PERSONAL GENOMICS INC2UNITED MICROELECTRICS CORP1UNITED MIROELECTRONICS CORP1
Top patents by PatentIndex Score
43 records- 0194US5950090AMethod for fabricating a metal-oxide semiconductor transistorUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 7, 1999·125 cites·20 claims
- 0286US11362223B2Method for manufacturing an optical sensorPERSONAL GENOMICS INC·Filed 2019·Granted Jun 14, 2022·2 cites·5 claims
- 0386US6475865B1Method of fabricating semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2000·Granted Nov 5, 2002·36 cites·6 claims
- 0486US5933748AShallow trench isolation processUNITED MICROELECTRONICS CORP·Filed 1996·Granted Aug 3, 1999·85 cites·11 claims
- 0579US6306722B1Method for fabricating shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 1999·Granted Oct 23, 2001·53 cites·22 claims
- 0678US6838357B2Chemical mechanical polishing for forming a shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 2002·Granted Jan 4, 2005·13 cites·23 claims
- 0777US6177336B1Method for fabricating a metal-oxide semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 23, 2001·40 cites·20 claims
- 0876US5770508AMethod of forming lightly doped drains in metalic oxide semiconductor componentsUNITED MICROELECTRONICS CORP·Filed 1997·Granted Jun 23, 1998·39 cites·18 claims
- 0975US6169012B1Chemical mechanical polishing for forming a shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 2, 2001·32 cites·6 claims
- 1074US7018906B2Chemical mechanical polishing for forming a shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 2004·Granted Mar 28, 2006·10 cites·10 claims
- 1172US5786255AMethod of forming a metallic oxide semiconductorUNITED MIROELECTRONICS CORP·Filed 1997·Granted Jul 28, 1998·38 cites·9 claims
- 1271US6200840B1Method for producing PMOS devicesUNITED MICROELECTRONICS CORP·Filed 1999·Granted Mar 13, 2001·31 cites·24 claims
- 1369US6174778B1Method of fabricating metal oxide semiconductorUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 16, 2001·34 cites·19 claims
- 1469US6004852AManufacture of MOSFET having LDD source/drain regionUNITED MICROELECTRONICS CORP·Filed 1997·Granted Dec 21, 1999·37 cites·1 claims
- 1565US6448159B1Chemical mechanical polishing for forming a shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 2000·Granted Sep 10, 2002·6 cites·4 claims
- 1665US5958795AChemical-mechanical polishing for shallow trench isolationUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 28, 1999·30 cites·7 claims
- 1764US6178543B1Method of designing active region pattern with shift dummy patternUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 23, 2001·25 cites·6 claims
- 1863US6894364B2Capacitor in an interconnect system and method of manufacturing thereofUNITED MICROELECTRONICS CORP·Filed 2003·Granted May 17, 2005·13 cites·13 claims
- 1961US6316330B1Method of fabricating a shallow trench isolation semiconductor deviceUNITED MICROELECTRONICS CORP·Filed 2000·Granted Nov 13, 2001·7 cites·3 claims
- 2061US6274450B1Method for implementing metal oxide semiconductor field effect transistorUNITED MICROELECTRONICS CORP·Filed 1999·Granted Aug 14, 2001·20 cites·18 claims
- 2161US6187645B1Method for manufacturing semiconductor device capable of preventing gate-to-drain capacitance and eliminating birds beak formationUNITED MICROELECTRONICS CORP·Filed 1999·Granted Feb 13, 2001·19 cites·10 claims
- 2258US6083827AMethod for fabricating local interconnectUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jul 4, 2000·22 cites·20 claims
- 2356US6140227AMethod of fabricating a glue layer of contact/viaUNITED MICROELECTRONICS CORP·Filed 1998·Granted Oct 31, 2000·20 cites·12 claims
- 2454US6486040B2Chemical mechanical polishing for forming a shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 2001·Granted Nov 26, 2002·2 cites·7 claims
- 2553US2016211390A1Optical Sensor with Light-Guiding Feature and Method for Preparing the SamePERSONAL GENOMICS INC·Filed 2016·Application pending·0 cites
- 2652US6136713AMethod for forming a shallow trench isolation structureUNITED MICROELECTRONICS CORP·Filed 1998·Granted Oct 24, 2000·17 cites·20 claims
- 2750US7001713B2Method of forming partial reverse active maskUNITED MICROELECTRONICS CORP·Filed 2001·Granted Feb 21, 2006·2 cites·7 claims
- 2849US6015755AMethod of fabricating a trench isolation structure using a reverse maskUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 18, 2000·15 cites·20 claims
- 2948US6133083AMethod to fabricate embedded DRAMUNITED MICROELECTRONICS CORP·Filed 1998·Granted Oct 17, 2000·9 cites·9 claims
- 3048US6117743AMethod of manufacturing MOS device using anti reflective coatingUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 12, 2000·13 cites·17 claims
- 3144US6063689AMethod for forming an isolationUNITED MICROELECTRONICS CORP·Filed 1998·Granted May 16, 2000·11 cites·13 claims
- 3243US6232161B1Method for forming a dummy active patternUNITED MICROELECTRONICS CORP·Filed 1998·Granted May 15, 2001·10 cites·4 claims
- 3343US6177332B1Method of manufacturing shallow trench isolationUNITED MICROELECTRONICS CORP·Filed 1998·Granted Jan 23, 2001·10 cites·16 claims
- 3442US5976984AProcess of making unlanded viasUNITED MICROELECTRONICS CORP·Filed 1997·Granted Nov 2, 1999·10 cites·13 claims
- 3541US6810511B2Method of designing active region pattern with shift dummy patternUNITED MICROELECTRONICS CORP·Filed 2002·Granted Oct 26, 2004·0 cites·16 claims
- 3640US6277699B1Method for forming a metal-oxide-semiconductor transistorUNITED MICROELECTRONICS CORP·Filed 1998·Granted Aug 21, 2001·6 cites·16 claims
- 3738US6228209B1Equipment for forming a glue layer of an openingUNITED MICROELECTRONICS CORP·Filed 1998·Granted May 8, 2001·6 cites·21 claims
- 3838US5861329AMethod of fabricating metal-oxide semiconductor (MOS) transistors with reduced level of degradation caused by hot carriersUNITED MICROELECTRICS CORP·Filed 1996·Granted Jan 19, 1999·7 cites·8 claims
- 3936US2002001919A1Method of forming partial reverse active maskUNITED MICROELECTRONICS CORP·Filed 2001·Application pending·0 cites
- 4034US6365471B1Method for producing PMOS devicesUNITED MICROELECTRONICS CORP·Filed 1999·Granted Apr 2, 2002·3 cites·6 claims
- 4134US6323105B1Method for fabricating an isolation structure including a shallow trench isolation structure and a local-oxidation isolation structureUNITED MICROELECTRONICS CORP·Filed 1998·Granted Nov 27, 2001·4 cites·13 claims
- 4232US6291111B1Method of trench polishingUNITED MICROELECTRONICS CORP·Filed 1998·Granted Sep 18, 2001·2 cites·3 claims
- 4330US2002045318A1Method for manufacturing mos transistorFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →