Inventor · disambiguated record
Serdar Manakli
Also filed as: MANAKLI SERDAR
9 granted patents·1 pending application·73 citations·filing 2002–2016
81Inventor score
Files withMANAKLI SERDAR4ASELTA NANOGRAPHICS2ST MICROELECTRONICS SA2COMMISSARIAT ENERGIE ATOMIQUE1MENTOR GRAPHICS CORP1
Top patents by PatentIndex Score
10 records- 0188US6807662B2Performance of integrated circuit components via a multiple exposure techniqueMENTOR GRAPHICS CORP·Filed 2002·Granted Oct 19, 2004·67 cites·66 claims
- 0276US8713499B2Electron-beam lithography method with correction of line ends by insertion of contrast patternsMANAKLI SERDAR·Filed 2011·Granted Apr 29, 2014·4 cites·10 claims
- 0366US9607808B2Method of electron-beam lithography with correction of corner roundingsMANAKLI SERDAR·Filed 2011·Granted Mar 28, 2017·2 cites·14 claims
- 0447US9891519B2Free form fracturing method for electronic or optical lithography using resist threshold controlASELTA NANOGRAPHICS·Filed 2014·Granted Feb 13, 2018·0 cites·13 claims
- 0547US7955914B2Method of producing an asymmetric architecture semi-conductor deviceST MICROELECTRONICS SA·Filed 2008·Granted Jun 7, 2011·0 cites·32 claims
- 0643US9250540B2Lithography method with combined optimization of radiated energy and design geometryMANAKLI SERDAR·Filed 2011·Granted Feb 2, 2016·0 cites·15 claims
- 0741US9235132B2Large-mesh cell-projection electron-beam lithography methodMANAKLI SERDAR·Filed 2011·Granted Jan 12, 2016·0 cites·14 claims
- 0838US7897308B2Method for transferring a predetermined pattern reducing proximity effectsCOMMISSARIAT ENERGIE ATOMIQUE·Filed 2006·Granted Mar 1, 2011·0 cites·11 claims
- 0933US2002187435A1Method of illuminating a layer of a material, in particular of photosensitive resinST MICROELECTRONICS SA·Filed 2002·Application pending·0 cites
- 1030US10197909B2Method of reducing shot count in direct writing by a particle or photon beamASELTA NANOGRAPHICS·Filed 2016·Granted Feb 5, 2019·0 cites·16 claims
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