Assignee
ASELTA NANOGRAPHICS
FR·12 granted patents·1 pending application·16 citations·filing 2013–2016
Top patents by PatentIndex Score
13 records- 0183US10534255B2Method of applying vertex based corrections to a semiconductor designASELTA NANOGRAPHICS·Filed 2015·Granted Jan 14, 2020·6 cites·15 claims
- 0279US9922159B2Free form fracturing method for electronic or optical lithographyASELTA NANOGRAPHICS·Filed 2015·Granted Mar 20, 2018·3 cites·4 claims
- 0373US10295912B2Method for determining the parameters of an IC manufacturing process modelASELTA NANOGRAPHICS·Filed 2015·Granted May 21, 2019·2 cites·15 claims
- 0465US10578978B2Method for determining the dose corrections to be applied to an IC manufacturing process by a matching procedureASELTA NANOGRAPHICS·Filed 2016·Granted Mar 3, 2020·1 cites·16 claims
- 0565US10156796B2Method for determining the parameters of an IC manufacturing process by a differential procedureASELTA NANOGRAPHICS·Filed 2015·Granted Dec 18, 2018·1 cites·23 claims
- 0664US8984451B2Free form fracturing method for electronic or optical lithographyASELTA NANOGRAPHICS·Filed 2013·Granted Mar 17, 2015·1 cites·13 claims
- 0761US10553394B2Method for the correction of electron proximity effectsASELTA NANOGRAPHICS·Filed 2014·Granted Feb 4, 2020·1 cites·14 claims
- 0857US10157728B2Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapesASELTA NANOGRAPHICS·Filed 2014·Granted Dec 18, 2018·1 cites·12 claims
- 0947US9891519B2Free form fracturing method for electronic or optical lithography using resist threshold controlASELTA NANOGRAPHICS·Filed 2014·Granted Feb 13, 2018·0 cites·13 claims
- 1041US2014172386A1Simulation Of Shot-Noise Effects In A Particle-Beam Lithography Process And Especially An E-Beam Lithography ProcessASELTA NANOGRAPHICS·Filed 2013·Application pending·0 cites
- 1140US9934336B2Method of correcting electron proximity effects using Voigt type scattering functionsASELTA NANOGRAPHICS·Filed 2013·Granted Apr 3, 2018·0 cites·14 claims
- 1238US10522328B2Method of performing dose modulation, in particular for electron beam lithographyASELTA NANOGRAPHICS·Filed 2016·Granted Dec 31, 2019·0 cites·16 claims
- 1330US10197909B2Method of reducing shot count in direct writing by a particle or photon beamASELTA NANOGRAPHICS·Filed 2016·Granted Feb 5, 2019·0 cites·16 claims
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