Inventor · disambiguated record
Avin Dhoble
Also filed as: DHOBLE AVIN · DHOBLE AVIN V
7 granted patents·5 pending applications·12 citations·filing 2005–2019
77Inventor score
Files withCOOKSON SINGAPORE PTE LTD2HO KIM S2ROHM & HAAS ELECT MAT2DHOBLE AVIN V1GALLAGHER MICHAEL K1
Top patents by PatentIndex Score
12 records- 0177US11497275B23D printed articles of footwear with particlesKORNIT DIGITAL TECH LTD·Filed 2018·Granted Nov 15, 2022·3 cites·20 claims
- 0270US8434667B2Polyamine, carboxylic acid flux composition and method of solderingWINKLE MARK R·Filed 2011·Granted May 7, 2013·3 cites·10 claims
- 0369US8430295B2Curable flux composition and method of solderingGALLAGHER MICHAEL K·Filed 2011·Granted Apr 30, 2013·3 cites·10 claims
- 0462US8434666B2Flux composition and method of solderingHO KIM S·Filed 2011·Granted May 7, 2013·1 cites·10 claims
- 0560US8430294B2Amine, carboxylic acid flux composition and method of solderingHO KIM S·Filed 2011·Granted Apr 30, 2013·1 cites·10 claims
- 0658US11427719B2Methods for the printing of materials using hybrid ink formulationsKORNIT DIGITAL LTD·Filed 2019·Granted Aug 30, 2022·0 cites·5 claims
- 0753US8430293B2Curable amine, carboxylic acid flux composition and method of solderingDHOBLE AVIN V·Filed 2011·Granted Apr 30, 2013·1 cites·10 claims
- 0842US2015371916A1Pre-applied underfillROHM & HAAS ELECT MAT·Filed 2014·Application pending·0 cites
- 0941US2015064851A1Pre-applied underfillROHM & HAAS ELECT MAT·Filed 2013·Application pending·0 cites
- 1040US2011209755A1Liquid crystal polymer barrier films for optoelectronicsSAINT GOBAIN PERFORMANCE PLAST·Filed 2010·Application pending·0 cites
- 1136US2007020810A1Thermoplastic/thermoset composition material and method of attaching a wafer to a substrateCOOKSON SINGAPORE PTE LTD·Filed 2006·Application pending·0 cites
- 1229US2007073008A1Compositions effective to suppress void formationCOOKSON SINGAPORE PTE LTD·Filed 2005·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Avin Dhoble files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →