Inventor · disambiguated record
Yoshiyuki Harita
Also filed as: HARITA YOSHIYUKI
23 granted patents·683 citations·filing 1974–2000
97Inventor score
Top patents by PatentIndex Score
23 records- 0198US5405720ARadiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solventJAPAN SYNTHETIC RUBBER CO LTD·Filed 1994·Granted Apr 11, 1995·129 cites·11 claims
- 0290US4106943APhotosensitive cross-linkable azide containing polymeric compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1976·Granted Aug 15, 1978·51 cites·5 claims
- 0389US4275142APhotosensitive compositions and printing plates containing sameJAPAN SYNTHETIC RUBBER CO LTD·Filed 1979·Granted Jun 23, 1981·44 cites·44 claims
- 0488US6270939B1Radiation-sensitive resin compositionJSR CORP·Filed 2000·Granted Aug 7, 2001·21 cites·15 claims
- 0585US4499171APositive type photosensitive resin composition with at least two o-quinone diazidesJAPAN SYNTHETIC RUBBER CO LTD·Filed 1983·Granted Feb 12, 1985·40 cites·18 claims
- 0681US5215857A1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solventJAPAN SYNTHETIC RUBBER CO LTD·Filed 1991·Granted Jun 1, 1993·37 cites·8 claims
- 0781US4963463ARadiation-sensitive resin composition with admixtures of O-quinone diazide and acid esters having nitrobenzyl or cyanobenzyl groupJAPAN SYNTHETIC RUBBER CO LTD·Filed 1989·Granted Oct 16, 1990·39 cites·12 claims
- 0880US4169068AStripping liquor composition for removing photoresists comprising hydrogen peroxideJAPAN SYNTHETIC RUBBER CO LTD·Filed 1977·Granted Sep 25, 1979·35 cites·5 claims
- 0979US4349619APhotoresist compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1980·Granted Sep 14, 1982·30 cites·17 claims
- 1078US5494784AMethod of pattern formation utilizing radiation-sensitive resin composition containing monooxymonocarboxylic acid ester solventJAPAN SYNTHETIC RUBBER CO LTD·Filed 1994·Granted Feb 27, 1996·21 cites·14 claims
- 1178US4384037APositive type photosensitive resin compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1981·Granted May 17, 1983·23 cites·14 claims
- 1277US6020104ARadiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solventJSR CORP·Filed 1999·Granted Feb 1, 2000·23 cites·15 claims
- 1376US6228554B1Radiation-sensitive resin compositionJSR CORP·Filed 1999·Granted May 8, 2001·23 cites·9 claims
- 1474US5925492ARadiation-sensitive resin composition utilizing monooxymonocarboxylic acid ester solventJSR CORP·Filed 1997·Granted Jul 20, 1999·21 cites·12 claims
- 1574US5238774ARadiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solventJAPAN SYNTHETIC RUBBER CO LTD·Filed 1991·Granted Aug 24, 1993·28 cites·11 claims
- 1673US5087548APositive type radiation-sensitive resin compositionJAPAN SYNTHETIC RUBBER CO INC·Filed 1988·Granted Feb 11, 1992·25 cites·1 claims
- 1761US4886565AReactive ion etching apparatusJAPAN SYNTHETIC RUBBER CO LTD·Filed 1989·Granted Dec 12, 1989·28 cites·10 claims
- 1859US4407927APhotoresist compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1982·Granted Oct 4, 1983·16 cites·14 claims
- 1958US3948667APhotosensitive compositionsJAPAN SYNTHETIC RUBBER CO LTD·Filed 1974·Granted Apr 6, 1976·14 cites·12 claims
- 2052US4623609AProcess for forming patterns using ionizing radiation sensitive resistJAPAN SYNTHETIC RUBBER CO LTD·Filed 1985·Granted Nov 18, 1986·9 cites·13 claims
- 2147US4957588AMethod for high temperature reaction processJAPAN SYNTHETIC RUBBER CO LTD·Filed 1989·Granted Sep 18, 1990·10 cites·13 claims
- 2247US4330612ALaminate of monolayer film of cyclized butadiene polymer and other photosensitive layerJAPAN SYNTHETIC RUBBER CO LTD·Filed 1980·Granted May 18, 1982·11 cites·14 claims
- 2338US4294908APhotoresist composition containing modified cyclized diene polymersJAPAN SYNTHETIC RUBBER CO LTD·Filed 1980·Granted Oct 13, 1981·5 cites·15 claims
Join the waitlist — get patent alerts
Get an alert when Yoshiyuki Harita files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →