Inventor · disambiguated record
Kathleen R. Early
Also filed as: EARLY KATHLEEN · EARLY KATHLEEN R · EARLY KATHLEEN REGINA
24 granted patents·824 citations·filing 1993–2001
97Inventor score
Top patents by PatentIndex Score
24 records- 0199US6534243B1Chemical feature doubling processADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 18, 2003·249 cites·20 claims
- 0292US6291137B1Sidewall formation for sidewall patterning of sub 100 nm structuresADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 18, 2001·132 cites·20 claims
- 0387US6094335AVertical parallel plate capacitorADVANCED MICRO DEVICES INC·Filed 1998·Granted Jul 25, 2000·69 cites·26 claims
- 0486US5265143AX-ray optical element including a multilayer coatingAT & T BELL LAB·Filed 1993·Granted Nov 23, 1993·73 cites·13 claims
- 0585US5939750AUse of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringersADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 17, 1999·44 cites·16 claims
- 0683US6455888B1Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringersADVANCED MICRO DEVICES INC·Filed 2000·Granted Sep 24, 2002·10 cites·11 claims
- 0778US6269322B1System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlayADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 31, 2001·45 cites·20 claims
- 0877US5356662AMethod for repairing an optical element which includes a multilayer coatingAT & T BELL LAB·Filed 1993·Granted Oct 18, 1994·32 cites·9 claims
- 0968US6423475B1Sidewall formation for sidewall patterning of sub 100 nm structuresADVANCED MICRO DEVICES INC·Filed 1999·Granted Jul 23, 2002·35 cites·20 claims
- 1068US6197455B1Lithographic mask repair using a scanning tunneling microscopeADVANCED MICRO DEVICES INC·Filed 1999·Granted Mar 6, 2001·25 cites·19 claims
- 1159US6030868AElimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidationADVANCED MICRO DEVICES INC·Filed 1998·Granted Feb 29, 2000·16 cites·13 claims
- 1258US6352930B1Bilayer anti-reflective coating and etch hard maskADVANCED MICRO DEVICES INC·Filed 2001·Granted Mar 5, 2002·5 cites·10 claims
- 1357US6316804B1Oxygen implant self-aligned, floating gate and isolation structureADVANCED MICRO DEVICES INC·Filed 2000·Granted Nov 13, 2001·5 cites·12 claims
- 1454US5780204ABackside wafer polishing for improved photolithographyADVANCED MICRO DEVICES INC·Filed 1997·Granted Jul 14, 1998·19 cites·22 claims
- 1551US6066530AOxygen implant self-aligned, floating gate and isolation structureADVANCED MICRO DEVICES INC·Filed 1998·Granted May 23, 2000·9 cites·5 claims
- 1651US5978441AExtreme ultraviolet lithography mask blank and manufacturing method thereforADVANCED MICRO DEVICES INC·Filed 1997·Granted Nov 2, 1999·10 cites·10 claims
- 1748US6214737B1Simplified sidewall formation for sidewall patterning of sub 100 nm structuresADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 10, 2001·14 cites·20 claims
- 1842US6043120AElimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidationADVANCED MICRO DEVICES INC·Filed 1998·Granted Mar 28, 2000·6 cites·17 claims
- 1941US6232002B1Bilayer anti-reflective coating and etch hard maskADVANCED MICRO DEVICES INC·Filed 1998·Granted May 15, 2001·7 cites·7 claims
- 2041US6110833AElimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidationADVANCED MICRO DEVICES INC·Filed 1998·Granted Aug 29, 2000·4 cites·13 claims
- 2138US6221768B1Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringersADVANCED MICRO DEVICES INC·Filed 1999·Granted Apr 24, 2001·3 cites·18 claims
- 2238US6136510ADoubled-sided wafer scrubbing for improved photolithographyADVANCED MICRO DEVICES INC·Filed 1997·Granted Oct 24, 2000·7 cites·19 claims
- 2335US6350559B1Method for creating thinner resist coating that also has fewer pinholesADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 26, 2002·4 cites·33 claims
- 2432US6117597AExtreme ultraviolet lithography mask blank and manufacturing method thereforADVANCED MICRO DEVICES INC·Filed 1999·Granted Sep 12, 2000·1 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →