Inventor · disambiguated record
Anton Bernhard Van Oosten
Also filed as: VAN OOSTEN ANTON BERNHARD
15 granted patents·5 pending applications·21 citations·filing 2011–2024
88Inventor score
Top patents by PatentIndex Score
20 records- 0196US11079687B2Process window based on defect probabilityASML NETHERLANDS BV·Filed 2018·Granted Aug 3, 2021·11 cites·20 claims
- 0288US10054862B2Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Aug 21, 2018·3 cites·19 claims
- 0384US11150560B2Projection system and mirror and radiation source for a lithographic apparatusASML NETHERLANDS BV·Filed 2020·Granted Oct 19, 2021·1 cites·7 claims
- 0481US10732511B2Projection system and mirror and radiation source for a lithographic apparatusASML NETHERLANDS BV·Filed 2019·Granted Aug 4, 2020·1 cites·19 claims
- 0581US2024126181A1Process window based on defect probabilityASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0677US10571812B2Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Feb 25, 2020·2 cites·15 claims
- 0775US11822255B2Process window based on defect probabilityASML NETHERLANDS BV·Filed 2021·Granted Nov 21, 2023·0 cites·20 claims
- 0875US2024412067A1Metrology Apparatus And Method For Determining A Characteristic Of One Or More Structures On A SubstrateASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0973US10216093B2Projection system and minor and radiation source for a lithographic apparatusASML NETHERLANDS BV·Filed 2013·Granted Feb 26, 2019·1 cites·27 claims
- 1073US2022404718A1Matching pupil determinationASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1172US11460782B2Matching pupil determinationASML NETHERLANDS BV·Filed 2019·Granted Oct 4, 2022·1 cites·20 claims
- 1272US11314174B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Apr 26, 2022·1 cites·12 claims
- 1354US12112260B2Metrology apparatus and method for determining a characteristic of one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Oct 8, 2024·0 cites·19 claims
- 1454US11287748B2Guided patterning device inspectionASML NETHERLANDS BV·Filed 2019·Granted Mar 29, 2022·0 cites·20 claims
- 1554US2018046091A1Inspection Apparatus, Inspection Method, Lithographic Apparatus, Patterning Device and Manufacturing MethodASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
- 1649US10775705B2Patterning stack optimizationASML NETHERLANDS BV·Filed 2017·Granted Sep 15, 2020·0 cites·21 claims
- 1749US10001710B2Inspection apparatus, inspection method, lithographic apparatus and manufacturing methodASML NETHERLANDS BV·Filed 2016·Granted Jun 19, 2018·0 cites·20 claims
- 1845US11054754B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Jul 6, 2021·0 cites·17 claims
- 1938US9798225B2Method of characterizing, method of forming a model, method of simulating, mask manufacturing method and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted Oct 24, 2017·0 cites·20 claims
- 2035US2011310369A1Lithographic method and apparatusMICKAN UWE·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →