Inventor · disambiguated record
Shahriar Naghshineh
Also filed as: NAGHSHINEH SHAHRIAR
6 granted patents·5 pending applications·416 citations·filing 1999–2012
88Inventor score
Files withADVANCED TECH MATERIALS3ESC INC3SURFACE CHEMISTRY DISCOVERIES2ADVANCED TEHNOLOGY MATERIALS I1NAGHSHINEH SHAHRIAR1
Top patents by PatentIndex Score
11 records- 0193US6492308B1Post chemical-mechanical planarization (CMP) cleaning compositionESC INC·Filed 2000·Granted Dec 10, 2002·96 cites·7 claims
- 0292US7365045B2Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxideADVANCED TEHNOLOGY MATERIALS I·Filed 2005·Granted Apr 29, 2008·32 cites·14 claims
- 0391US6723691B2Post chemical-mechanical planarization (CMP) cleaning compositionADVANCED TECH MATERIALS·Filed 2001·Granted Apr 20, 2004·73 cites·8 claims
- 0490US6627587B2Cleaning compositionsESC INC·Filed 2001·Granted Sep 30, 2003·67 cites·5 claims
- 0589US6194366B1Post chemical-mechanical planarization (CMP) cleaning compositionESC INC·Filed 1999·Granted Feb 27, 2001·123 cites·9 claims
- 0680US6851432B2Cleaning compositionsADVANCED TECH MATERIALS·Filed 2003·Granted Feb 8, 2005·25 cites·2 claims
- 0752US2012187336A1Conditioning compositions for solar cellsNAGHSHINEH SHAHRIAR·Filed 2012·Application pending·0 cites
- 0851US2009120457A1Compositions and method for removing coatings and preparation of surfaces for use in metal finishing, and manufacturing of electronic and microelectronic devicesSURFACE CHEMISTRY DISCOVERIES·Filed 2008·Application pending·0 cites
- 0951US2008200361A1Aqueous cleaner with low metal etch rateWALKER ELIZABETH L·Filed 2008·Application pending·0 cites
- 1046US2006148666A1Aqueous cleaner with low metal etch rateADVANCED TECH MATERIALS·Filed 2004·Application pending·0 cites
- 1146US2010018550A1Cleaning compositions with very low dielectric etch ratesSURFACE CHEMISTRY DISCOVERIES·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →